Hgi-jcdjcte surface after chemical etching and electrochemical reduction

Kengo Shimanoe, Masao Sakashita

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6 Citations (Scopus)


Surface compositions of Hg,_vCdvTe (MCT) after chemical etching and electrochemical reduction have been studied with an angle-dependent X-ray photoelectron spectroscopy (XPS) technique. The degree of oxidation formed after the chemical etching in Br2-methanol solutions is dependent on Br2 concentration but independent of etching time. The etched surface is Te-rich. The cation fraction x deviates from that of the bulk value. The oxides and accumulated elemental Te are eliminated from the etched surface by the reduction at —0.9 V vs Ag/AgCl for 1 h in pH 5.0 acetic-acetate solution. The cation/anion ratio and cation fraction x approach the bulk value and are constant in the depth. Furthermore, it is confirmed that the electrochemically reduced surface is more stable in atmospheric oxygen than the chemically etched MCT. This electrochemical reduction is used for treatment prior to surface passivation.

Original languageEnglish
Pages (from-to)2723-2729
Number of pages7
JournalJapanese journal of applied physics
Issue number11R
Publication statusPublished - Nov 1991
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)


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