TY - JOUR
T1 - Heteroepitaxial growth of β-AIN films on sapphire (0001) in nitrogen atmospheres by pulse laser deposition
AU - Yoshida, Tomohiro
AU - Ueda, Yutaro
AU - Daio, Takeshi
AU - Tominaga, Aki
AU - Okajima, Toshihiro
AU - Yoshitake, Tsuyoshi
N1 - Publisher Copyright:
© 2015 The Japan Society of Applied Physics.
PY - 2015/6/1
Y1 - 2015/6/1
N2 - β-AIN thin films were heteroepitaxially grown on sapphire (0001) substrates with a smooth surface showing steps in nitrogen atmospheres by pulsed laser deposition using sintered AIN targets, and their films were structurally studied by X-ray diffraction (XRD) and transmission electron microscopy (TEM). Horizontally oriented growth of β-AIN(111) was confirmed by XRD in 2θ-θ scan. The epitaxial relationship between β-AIN and sapphire was derived to be β-AIN(111)[121] || sapphire (0001)[1120] from the TEM measurement. The existence of dislocation defects was implied from the electron diffraction pattern of the film. The heteroepitaxial growth probably occurs in domain match epitaxy, accompanied by the generation of dislocations defects at the interface.
AB - β-AIN thin films were heteroepitaxially grown on sapphire (0001) substrates with a smooth surface showing steps in nitrogen atmospheres by pulsed laser deposition using sintered AIN targets, and their films were structurally studied by X-ray diffraction (XRD) and transmission electron microscopy (TEM). Horizontally oriented growth of β-AIN(111) was confirmed by XRD in 2θ-θ scan. The epitaxial relationship between β-AIN and sapphire was derived to be β-AIN(111)[121] || sapphire (0001)[1120] from the TEM measurement. The existence of dislocation defects was implied from the electron diffraction pattern of the film. The heteroepitaxial growth probably occurs in domain match epitaxy, accompanied by the generation of dislocations defects at the interface.
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U2 - 10.7567/JJAP.54.06FJ05
DO - 10.7567/JJAP.54.06FJ05
M3 - Article
AN - SCOPUS:84930695152
SN - 0021-4922
VL - 54
JO - Japanese journal of applied physics
JF - Japanese journal of applied physics
IS - 6
M1 - 06FJ05
ER -