Hetero-epitaxial growth of YBCO thin films on the A-cut plane sapphire substrates

S. Ohshima, M. Shirakawa, T. Nishimura, A. Saito, M. Mukaida

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    Abstract

    We examined the hetero-epitaxial growth of YBCO thin films on the a-cut plane sapphire substrates for the passive microwave applications, because the a-cut plane sapphire substrates have smaller in-plane anisotropy of the dielectric constant compared with that of r-cut plane sapphire substrates. The CeO2 buffer layers and YBCO thin films were prepared by an inductive-coupled plasma sputtering method. We found that perfect in-plane alignment of the CeO2 buffer layer could be obtained on the a-cut plane sapphire substrates. Also we could obtain the hetero-epitaxial YBCO thin films on CeO2/a-cut plane sapphire substrates. Tc of the YBCO thin films was approximately 89 K, and the surface resistance (Rs) of the YBCO thin films was approximately 1 mΩ at 50 K and at 22 GHz, equivalently to values for YBCO thin films fabricated on the r-cut plane sapphire substrates.

    Original languageEnglish
    Pages (from-to)2985-2988
    Number of pages4
    JournalIEEE Transactions on Applied Superconductivity
    Volume15
    Issue number2 PART III
    DOIs
    Publication statusPublished - Jun 2005

    All Science Journal Classification (ASJC) codes

    • Electronic, Optical and Magnetic Materials
    • Condensed Matter Physics
    • Electrical and Electronic Engineering

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