TY - GEN
T1 - Growth stimulation of radish sprouts using discharge plasmas
AU - Kitazaki, Satoshi
AU - Yamashita, Daisuke
AU - Matsuzaki, Hidefumi
AU - Uchida, Giichirou
AU - Koga, Kazunori
AU - Shiratani, Masaharu
AU - Hayashi, Nobuya
N1 - Copyright:
Copyright 2011 Elsevier B.V., All rights reserved.
PY - 2010
Y1 - 2010
N2 - We have investigated growth stimulation of radish sprouts using nonthermal atmospheric pressure He discharge plasmas and low pressure O2 RF discharge plasmas. Seeds of radish sprouts were irradiated by one of these plasmas. After 7 days cultivation, the average length of sprouts with irradiation was 15-60 % longer than those without irradiation. Reactive oxygen species may be involved in the growth stimulation mechanism.
AB - We have investigated growth stimulation of radish sprouts using nonthermal atmospheric pressure He discharge plasmas and low pressure O2 RF discharge plasmas. Seeds of radish sprouts were irradiated by one of these plasmas. After 7 days cultivation, the average length of sprouts with irradiation was 15-60 % longer than those without irradiation. Reactive oxygen species may be involved in the growth stimulation mechanism.
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U2 - 10.1109/TENCON.2010.5686474
DO - 10.1109/TENCON.2010.5686474
M3 - Conference contribution
AN - SCOPUS:79951640885
SN - 9781424468904
T3 - IEEE Region 10 Annual International Conference, Proceedings/TENCON
SP - 1960
EP - 1963
BT - TENCON 2010 - 2010 IEEE Region 10 Conference
T2 - 2010 IEEE Region 10 Conference, TENCON 2010
Y2 - 21 November 2010 through 24 November 2010
ER -