Growth stimulation of radish sprouts using discharge plasmas

Satoshi Kitazaki, Daisuke Yamashita, Hidefumi Matsuzaki, Giichirou Uchida, Kazunori Koga, Masaharu Shiratani, Nobuya Hayashi

Research output: Chapter in Book/Report/Conference proceedingConference contribution

14 Citations (Scopus)


We have investigated growth stimulation of radish sprouts using nonthermal atmospheric pressure He discharge plasmas and low pressure O2 RF discharge plasmas. Seeds of radish sprouts were irradiated by one of these plasmas. After 7 days cultivation, the average length of sprouts with irradiation was 15-60 % longer than those without irradiation. Reactive oxygen species may be involved in the growth stimulation mechanism.

Original languageEnglish
Title of host publicationTENCON 2010 - 2010 IEEE Region 10 Conference
Number of pages4
Publication statusPublished - 2010
Event2010 IEEE Region 10 Conference, TENCON 2010 - Fukuoka, Japan
Duration: Nov 21 2010Nov 24 2010

Publication series

NameIEEE Region 10 Annual International Conference, Proceedings/TENCON


Other2010 IEEE Region 10 Conference, TENCON 2010

All Science Journal Classification (ASJC) codes

  • Computer Science Applications
  • Electrical and Electronic Engineering


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