Growth Control of Clusters in Reactive Plasmas and Application to High-Stability a-Si: H Film Deposition

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All Science Journal Classification (ASJC) codes

@inbook{1249bd38cbd04a269128df1fb899e10c,

title = "Growth Control of Clusters in Reactive Plasmas and Application to High-Stability a-Si: H Film Deposition",

author = "Yukio Watanabe and Masaharu Shiratani and Kazunori Koga",

year = "2008",

month = apr,

day = "8",

doi = "10.1002/9783527622184.ch12",

language = "English",

isbn = "9783527405916",

pages = "227--242",

booktitle = "Advanced Plasma Technology",

publisher = "Wiley - VCH Verlag GmbH & CO. KGaA",

address = "Germany",

}

TY - CHAP

T1 - Growth Control of Clusters in Reactive Plasmas and Application to High-Stability a-Si

T2 - H Film Deposition

AU - Watanabe, Yukio

AU - Shiratani, Masaharu

AU - Koga, Kazunori

PY - 2008/4/8

Y1 - 2008/4/8

UR - http://www.scopus.com/inward/record.url?scp=84889877237&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84889877237&partnerID=8YFLogxK

U2 - 10.1002/9783527622184.ch12

DO - 10.1002/9783527622184.ch12

M3 - Chapter

AN - SCOPUS:84889877237

SN - 9783527405916

SP - 227

EP - 242

BT - Advanced Plasma Technology

PB - Wiley - VCH Verlag GmbH & CO. KGaA

ER -