Ga-focused ion beam time-of-flight secondary ion mass spectrometer analysis of the grain boundary segregation/precipitation of boron in steel

Tomohito Tanaka, Taishi Fujishiro, Genichi Shigesato, Shun Ichi Hayashi

Research output: Contribution to journalArticlepeer-review

8 Citations (Scopus)

Abstract

Ga-focused ion beam time-of-flight secondary ion mass spectrometry (FIB-TOF-SIMS) analysis was performed to investigate the grain boundary segregation/precipitation of boron in steel. To overcome the low secondary ion yield from the primary Ga+ source and the sensitivity using a high-resolution Ga-FIB source, a low energy oxygen ion beam was used prior to the Ga-FIB-TOF-SIMS analysis. As a result, it was found that Ga-FIB-TOF-SIMS is a very powerful tool for mapping boron segregation and/or precipitation in steel with a spatial resolution of ~200 nm. In addition, the results were strongly dependent on the surface composition.

Original languageEnglish
Pages (from-to)297-300
Number of pages4
JournalSurface and Interface Analysis
Volume46
Issue number5
DOIs
Publication statusPublished - May 2014
Externally publishedYes

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