Formation of ordered nanometer-sized polymer dots on silicon by friction rubbing method

Masahito Sano; Jyunko Okamura; Seiji Shinkai

doi:10.1246/cl.1998.21

Formation of ordered nanometer-sized polymer dots on silicon by friction rubbing method

Masahito Sano, Jyunko Okamura, Seiji Shinkai

Research output: Contribution to journal › Article › peer-review

5 Citations (Scopus)

Abstract

Regular arrays of poly(ethylene) deposits, about 10 nm high and 160 nm in diameter, separated by 340 nm, were formed by simply rubbing the polymer plate against the surface of silicon just below the melting point of the polymer.

Original language	English
Pages (from-to)	21-22
Number of pages	2
Journal	Chemistry Letters
Issue number	1
DOIs	https://doi.org/10.1246/cl.1998.21
Publication status	Published - 1998
Externally published	Yes

All Science Journal Classification (ASJC) codes

Chemistry(all)

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10.1246/cl.1998.21

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@article{dd9186f234cd4cc9bedfa8d16c2e2c32,

title = "Formation of ordered nanometer-sized polymer dots on silicon by friction rubbing method",

abstract = "Regular arrays of poly(ethylene) deposits, about 10 nm high and 160 nm in diameter, separated by 340 nm, were formed by simply rubbing the polymer plate against the surface of silicon just below the melting point of the polymer.",

author = "Masahito Sano and Jyunko Okamura and Seiji Shinkai",

year = "1998",

doi = "10.1246/cl.1998.21",

language = "English",

pages = "21--22",

journal = "Chemistry Letters",

issn = "0366-7022",

publisher = "The Chemical Society of Japan",

number = "1",

}

TY - JOUR

T1 - Formation of ordered nanometer-sized polymer dots on silicon by friction rubbing method

AU - Sano, Masahito

AU - Okamura, Jyunko

AU - Shinkai, Seiji

PY - 1998

Y1 - 1998

N2 - Regular arrays of poly(ethylene) deposits, about 10 nm high and 160 nm in diameter, separated by 340 nm, were formed by simply rubbing the polymer plate against the surface of silicon just below the melting point of the polymer.

AB - Regular arrays of poly(ethylene) deposits, about 10 nm high and 160 nm in diameter, separated by 340 nm, were formed by simply rubbing the polymer plate against the surface of silicon just below the melting point of the polymer.

UR - http://www.scopus.com/inward/record.url?scp=0032376353&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0032376353&partnerID=8YFLogxK

U2 - 10.1246/cl.1998.21

DO - 10.1246/cl.1998.21

M3 - Article

AN - SCOPUS:0032376353

SN - 0366-7022

SP - 21

EP - 22

JO - Chemistry Letters

JF - Chemistry Letters

IS - 1

ER -

Formation of ordered nanometer-sized polymer dots on silicon by friction rubbing method

Abstract

All Science Journal Classification (ASJC) codes

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