Fine wettability control created by a photochemical combination method for inkjet printing on self-assembled monolayers

Youichi Tsuchiya; Shuichi Haraguchi; Masashi Ogawa; Tomohiro Shiraki; Hidenobu Kakimoto; Osamu Gotou; Takeshi Yamada; Kenji Okumoto; Shuhei Nakatani; Kei Sakanoue; Seiji Shinkai

doi:10.1002/adma.201104277

Fine wettability control created by a photochemical combination method for inkjet printing on self-assembled monolayers

Youichi Tsuchiya, Shuichi Haraguchi, Masashi Ogawa, Tomohiro Shiraki, Hidenobu Kakimoto, Osamu Gotou, Takeshi Yamada, Kenji Okumoto, Shuhei Nakatani, Kei Sakanoue, Seiji Shinkai

Institute for Advanced Study

Research output: Contribution to journal › Article › peer-review

12 Citations (Scopus)

Abstract

Wettability tuning for organic solvents is demonstrated with the "combination method", a reversal of the conventional "cleavage method". Several advantages are inherent to this method: for example, the syntheses are simple, various surface-active groups can be used, and the reaction proceeds with a low-energy light source. The image shows the result after UV irradiation through a patterning mask.

Original language	English
Pages (from-to)	968-972
Number of pages	5
Journal	Advanced Materials
Volume	24
Issue number	7
DOIs	https://doi.org/10.1002/adma.201104277
Publication status	Published - Feb 14 2012

All Science Journal Classification (ASJC) codes

Materials Science(all)
Mechanics of Materials
Mechanical Engineering

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10.1002/adma.201104277

Cite this

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T1 - Fine wettability control created by a photochemical combination method for inkjet printing on self-assembled monolayers

AU - Tsuchiya, Youichi

AU - Haraguchi, Shuichi

AU - Ogawa, Masashi

AU - Shiraki, Tomohiro

AU - Kakimoto, Hidenobu

AU - Gotou, Osamu

AU - Yamada, Takeshi

AU - Okumoto, Kenji

AU - Nakatani, Shuhei

AU - Sakanoue, Kei

AU - Shinkai, Seiji

PY - 2012/2/14

Y1 - 2012/2/14

N2 - Wettability tuning for organic solvents is demonstrated with the "combination method", a reversal of the conventional "cleavage method". Several advantages are inherent to this method: for example, the syntheses are simple, various surface-active groups can be used, and the reaction proceeds with a low-energy light source. The image shows the result after UV irradiation through a patterning mask.

AB - Wettability tuning for organic solvents is demonstrated with the "combination method", a reversal of the conventional "cleavage method". Several advantages are inherent to this method: for example, the syntheses are simple, various surface-active groups can be used, and the reaction proceeds with a low-energy light source. The image shows the result after UV irradiation through a patterning mask.

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JO - Advanced Materials

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Fine wettability control created by a photochemical combination method for inkjet printing on self-assembled monolayers

Abstract

All Science Journal Classification (ASJC) codes

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