TY - JOUR
T1 - Film thickness dependence of ferroelectric properties of (111)-Oriented epitaxial Bi(Mg 1/2Ti 1/2)O 3 films
AU - Oikawa, Takahiro
AU - Yasui, Shintaro
AU - Watanabe, Takayuki
AU - Yabuta, Hisato
AU - Ehara, Yoshitaka
AU - Fukui, Tetsuro
AU - Funakubo, Hiroshi
PY - 2012/9
Y1 - 2012/9
N2 - The origin of the ferroelectricity of Bi(Mg 1/2Ti 1/2)O 3 films was investigated. Epitaxial Bi(Mg 1/2Ti 1/2)O 3 films with film thicknesses of 50 to 800nm were grown on (111)cSrRuO 3/(111)SrTiO 3 substrates by pulsed laser deposition. A Bi(Mg 1/2Ti 1/2)O 3 film was not strongly clamped from the substrate and identified to have rhombohedral symmetry with a = 0.398nm and α = 89:8°, which was independent of film thickness within 100 to 800 nm. The relative dielectric constant, remanent polarization, and coercive field of the Bi(Mg 1/2Ti 1/2)O 3 films at room temperature were almost constant at about 250, 60 μC/cm 2, and 240 kV/cm, respectively, for film thicknesses above 200 nm. These data suggest that Bi(Mg 1/2Ti 1/2)O 3 films are ferroelectric.
AB - The origin of the ferroelectricity of Bi(Mg 1/2Ti 1/2)O 3 films was investigated. Epitaxial Bi(Mg 1/2Ti 1/2)O 3 films with film thicknesses of 50 to 800nm were grown on (111)cSrRuO 3/(111)SrTiO 3 substrates by pulsed laser deposition. A Bi(Mg 1/2Ti 1/2)O 3 film was not strongly clamped from the substrate and identified to have rhombohedral symmetry with a = 0.398nm and α = 89:8°, which was independent of film thickness within 100 to 800 nm. The relative dielectric constant, remanent polarization, and coercive field of the Bi(Mg 1/2Ti 1/2)O 3 films at room temperature were almost constant at about 250, 60 μC/cm 2, and 240 kV/cm, respectively, for film thicknesses above 200 nm. These data suggest that Bi(Mg 1/2Ti 1/2)O 3 films are ferroelectric.
UR - http://www.scopus.com/inward/record.url?scp=84867750780&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84867750780&partnerID=8YFLogxK
U2 - 10.1143/JJAP.51.09LA04
DO - 10.1143/JJAP.51.09LA04
M3 - Article
AN - SCOPUS:84867750780
SN - 0021-4922
VL - 51
JO - Japanese journal of applied physics
JF - Japanese journal of applied physics
IS - 9 PART 2
M1 - 09LA04
ER -