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Ferroelectricity of nondoped thin HfO2 films in TiN/HfO2/TiN stacks
Tomonori Nishimura, Lun Xu, Shigehisa Shibayama, Takeaki Yajima, Shinji Migita, Akira Toriumi
Research output: Contribution to journal › Article › peer-review
74
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(Scopus)