Abstract
The gettering behavior of Fe into Si at 600°C for samples with and without a p+ layer was investigated by deep-level transient spectroscopy. These samples contaminated with Fe at 930°C for 4 h at a concentration of 4.6 × 1013 cm-3 were annealed at 600°C to induce gettering. The concentration of Fe atoms in the bulk Si markedly decreased-with annealing time at 600°C. It was found that the gettering site of Fe is not the p+ layer but the very thin surface layer.
Original language | English |
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Pages (from-to) | 4060-4061 |
Number of pages | 2 |
Journal | Japanese Journal of Applied Physics |
Volume | 44 |
Issue number | 6 A |
DOIs | |
Publication status | Published - Jun 2005 |
All Science Journal Classification (ASJC) codes
- Engineering(all)
- Physics and Astronomy(all)