Fast diffusion of water molecules into chemically modified sio2 films formed by chemical vapor deposition

Atsushi Ohtake; Kinya Kobayashi; Syuhei Kurokawa; Osamu Ohnishi; Toshiro Doi

doi:10.1246/cl.2012.60

Fast diffusion of water molecules into chemically modified sio2 films formed by chemical vapor deposition

Atsushi Ohtake, Kinya Kobayashi, Syuhei Kurokawa, Osamu Ohnishi, Toshiro Doi

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Abstract

We investigated water permeation properties into silicon oxide (SiO ₂) and chemically modified SiO ₂ films. The water permeability of fluorinated SiO ₂ (SiOF) is higher than that of SiO ₂, indicating that SiOF may have fast diffusion paths constructed from SiOF structures formed by the breaking of SiOSi networks by F atoms. It is suggested that the presence of these fast diffusion paths can explain the reason for the high water permeability of various kinds of SiOF and other low-k films.

Original language	English
Pages (from-to)	60-61
Number of pages	2
Journal	Chemistry Letters
Volume	41
Issue number	1
DOIs	https://doi.org/10.1246/cl.2012.60
Publication status	Published - Jan 6 2012

All Science Journal Classification (ASJC) codes

Chemistry(all)

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10.1246/cl.2012.60

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abstract = "We investigated water permeation properties into silicon oxide (SiO 2) and chemically modified SiO 2 films. The water permeability of fluorinated SiO 2 (SiOF) is higher than that of SiO 2, indicating that SiOF may have fast diffusion paths constructed from SiOF structures formed by the breaking of SiOSi networks by F atoms. It is suggested that the presence of these fast diffusion paths can explain the reason for the high water permeability of various kinds of SiOF and other low-k films.",

author = "Atsushi Ohtake and Kinya Kobayashi and Syuhei Kurokawa and Osamu Ohnishi and Toshiro Doi",

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AU - Ohtake, Atsushi

AU - Kobayashi, Kinya

AU - Kurokawa, Syuhei

AU - Ohnishi, Osamu

AU - Doi, Toshiro

PY - 2012/1/6

Y1 - 2012/1/6

N2 - We investigated water permeation properties into silicon oxide (SiO 2) and chemically modified SiO 2 films. The water permeability of fluorinated SiO 2 (SiOF) is higher than that of SiO 2, indicating that SiOF may have fast diffusion paths constructed from SiOF structures formed by the breaking of SiOSi networks by F atoms. It is suggested that the presence of these fast diffusion paths can explain the reason for the high water permeability of various kinds of SiOF and other low-k films.

AB - We investigated water permeation properties into silicon oxide (SiO 2) and chemically modified SiO 2 films. The water permeability of fluorinated SiO 2 (SiOF) is higher than that of SiO 2, indicating that SiOF may have fast diffusion paths constructed from SiOF structures formed by the breaking of SiOSi networks by F atoms. It is suggested that the presence of these fast diffusion paths can explain the reason for the high water permeability of various kinds of SiOF and other low-k films.

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Fast diffusion of water molecules into chemically modified sio2 films formed by chemical vapor deposition

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