Facile photofabrication of stable, submicrometer-wide, electrically conductive patterns

Chang Dae Keum; Takashi Fukuda; Him Matsuda; Kaoru Tamada

doi:10.1002/adma.200306175

Facile photofabrication of stable, submicrometer-wide, electrically conductive patterns

Chang Dae Keum, Takashi Fukuda, Him Matsuda, Kaoru Tamada

Research output: Contribution to journal › Article › peer-review

1 Citation (Scopus)

Abstract

A fabrication method for submicrometor-wide electric conductive patterns using Ag nanoparticle/polymer composites on furan-functionalized substrates (see Figure) is reported. A 180 nm wide (full width at half maximum) photofabricatcd pattern has been achieved, well below the wavelength of incident light. After anneating at 200°C for 40 min. the pattern worked as an electric wire with a resistivity of -8 × 10⁴ Ω cm.

Original language	English
Pages (from-to)	696-699
Number of pages	4
Journal	Advanced Materials
Volume	16
Issue number	8
DOIs	https://doi.org/10.1002/adma.200306175
Publication status	Published - Apr 19 2004
Externally published	Yes

All Science Journal Classification (ASJC) codes

Materials Science(all)
Mechanics of Materials
Mechanical Engineering

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10.1002/adma.200306175

Cite this

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title = "Facile photofabrication of stable, submicrometer-wide, electrically conductive patterns",

abstract = "A fabrication method for submicrometor-wide electric conductive patterns using Ag nanoparticle/polymer composites on furan-functionalized substrates (see Figure) is reported. A 180 nm wide (full width at half maximum) photofabricatcd pattern has been achieved, well below the wavelength of incident light. After anneating at 200°C for 40 min. the pattern worked as an electric wire with a resistivity of -8 × 104 Ω cm.",

author = "Keum, {Chang Dae} and Takashi Fukuda and Him Matsuda and Kaoru Tamada",

year = "2004",

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AU - Keum, Chang Dae

AU - Fukuda, Takashi

AU - Matsuda, Him

AU - Tamada, Kaoru

PY - 2004/4/19

Y1 - 2004/4/19

N2 - A fabrication method for submicrometor-wide electric conductive patterns using Ag nanoparticle/polymer composites on furan-functionalized substrates (see Figure) is reported. A 180 nm wide (full width at half maximum) photofabricatcd pattern has been achieved, well below the wavelength of incident light. After anneating at 200°C for 40 min. the pattern worked as an electric wire with a resistivity of -8 × 104 Ω cm.

AB - A fabrication method for submicrometor-wide electric conductive patterns using Ag nanoparticle/polymer composites on furan-functionalized substrates (see Figure) is reported. A 180 nm wide (full width at half maximum) photofabricatcd pattern has been achieved, well below the wavelength of incident light. After anneating at 200°C for 40 min. the pattern worked as an electric wire with a resistivity of -8 × 104 Ω cm.

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DO - 10.1002/adma.200306175

M3 - Article

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EP - 699

JO - Advanced Materials

JF - Advanced Materials

IS - 8

ER -

Facile photofabrication of stable, submicrometer-wide, electrically conductive patterns

Abstract

All Science Journal Classification (ASJC) codes

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