Fabrication of Thin Si Films and Ultra Thin Si Dioxide Films by Using Electron Cyclotron Resonance Plasmas and Electrical Evaluation of the Fabricated Thin Films

Hiroshi Nakashima

    Research output: Contribution to journalArticlepeer-review

    Original languageEnglish
    Pages (from-to)739-744
    Number of pages6
    JournalShinku/Journal of the Vacuum Society of Japan
    Issue number10
    Publication statusPublished - Jan 2002

    All Science Journal Classification (ASJC) codes

    • Condensed Matter Physics
    • Surfaces, Coatings and Films
    • Electrical and Electronic Engineering

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