Fabrication of PblnAu Josephson Tunnel Junctions and Evaluation of their Basic Properties

Naoto Uchida; Keiji Enpuku; Fujio Irie; Keiji Yoshida

doi:10.3131/jvsj.25.613

Fabrication of PblnAu Josephson Tunnel Junctions and Evaluation of their Basic Properties

Naoto Uchida, Keiji Enpuku, Fujio Irie, Keiji Yoshida

Superconductive Systems Engineering Laboratory

Research output: Contribution to journal › Article › peer-review

Abstract

PblnAu Josephson tunnel junctions are fabricated by RF plasma oxidation procedure, and their properties are investigated quantitatively in order to diagnose junctions. From the comparison between theory and experiment of dc current-voltage characteristics, some basic parameters of the junction are obtained. The relation between junction parameters and the oxide barrier is also discussed from the change of junction parameters due to the aging effect. Futhermore, a method is given to determine the distribution of the critical current density from the dc current-voltage characteristic, and a uniformity of the oxide barrier is discussed by using this method.

Original language	English
Pages (from-to)	613-623
Number of pages	11
Journal	Shinku/Journal of the Vacuum Society of Japan
Volume	25
Issue number	9
DOIs	https://doi.org/10.3131/jvsj.25.613
Publication status	Published - Jan 1982

All Science Journal Classification (ASJC) codes

Condensed Matter Physics
Surfaces, Coatings and Films
Electrical and Electronic Engineering

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abstract = "PblnAu Josephson tunnel junctions are fabricated by RF plasma oxidation procedure, and their properties are investigated quantitatively in order to diagnose junctions. From the comparison between theory and experiment of dc current-voltage characteristics, some basic parameters of the junction are obtained. The relation between junction parameters and the oxide barrier is also discussed from the change of junction parameters due to the aging effect. Futhermore, a method is given to determine the distribution of the critical current density from the dc current-voltage characteristic, and a uniformity of the oxide barrier is discussed by using this method.",

author = "Naoto Uchida and Keiji Enpuku and Fujio Irie and Keiji Yoshida",

year = "1982",

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AU - Uchida, Naoto

AU - Enpuku, Keiji

AU - Irie, Fujio

AU - Yoshida, Keiji

PY - 1982/1

Y1 - 1982/1

N2 - PblnAu Josephson tunnel junctions are fabricated by RF plasma oxidation procedure, and their properties are investigated quantitatively in order to diagnose junctions. From the comparison between theory and experiment of dc current-voltage characteristics, some basic parameters of the junction are obtained. The relation between junction parameters and the oxide barrier is also discussed from the change of junction parameters due to the aging effect. Futhermore, a method is given to determine the distribution of the critical current density from the dc current-voltage characteristic, and a uniformity of the oxide barrier is discussed by using this method.

AB - PblnAu Josephson tunnel junctions are fabricated by RF plasma oxidation procedure, and their properties are investigated quantitatively in order to diagnose junctions. From the comparison between theory and experiment of dc current-voltage characteristics, some basic parameters of the junction are obtained. The relation between junction parameters and the oxide barrier is also discussed from the change of junction parameters due to the aging effect. Futhermore, a method is given to determine the distribution of the critical current density from the dc current-voltage characteristic, and a uniformity of the oxide barrier is discussed by using this method.

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Fabrication of PblnAu Josephson Tunnel Junctions and Evaluation of their Basic Properties

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