Fabrication of nanoparticles of oxide materials by UV pulsed laser ablation in gas phase

Rio Suzuki, Reiji Koike, Keita Katayama, Mitsuhiro Higashihata, Hiroshi Ikenoue, Daisuke Nakamura

Research output: Chapter in Book/Report/Conference proceedingConference contribution


SiO2 nanoporous films has been attracting attention as low-k dielectric constant insulating films. We have succeeded in SiO2 nanoparticles with a particle size of a few nm and depositing a nanoporous film by pulsed laser deposition with controlling the ambient gas pressure. However, the details of the formation process of SiO2 nanoparticles have not been clarified. In this study, we visualized the time-resolved nanoparticle distribution in the gas phase by laser imaging technique to clarify the nanoparticle formation process and to be helpful for optimizing the growth condition of the low-k nanoporous film.

Original languageEnglish
Title of host publicationLaser-Based Micro- and Nanoprocessing XV
EditorsUdo Klotzbach, Akira Watanabe, Rainer Kling
ISBN (Electronic)9781510641839
Publication statusPublished - 2021
EventLaser-Based Micro- and Nanoprocessing XV 2021 - Virtual, Online, United States
Duration: Mar 6 2021Mar 11 2021

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X


ConferenceLaser-Based Micro- and Nanoprocessing XV 2021
Country/TerritoryUnited States
CityVirtual, Online

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering


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