Fabrication of nanoparticles of oxide materials by UV pulsed laser ablation in gas phase

Rio Suzuki; Reiji Koike; Keita Katayama; Mitsuhiro Higashihata; Hiroshi Ikenoue; Daisuke Nakamura

doi:10.1117/12.2576843

Fabrication of nanoparticles of oxide materials by UV pulsed laser ablation in gas phase

Rio Suzuki, Reiji Koike, Keita Katayama, Mitsuhiro Higashihata, Hiroshi Ikenoue, Daisuke Nakamura

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

SiO₂ nanoporous films has been attracting attention as low-k dielectric constant insulating films. We have succeeded in SiO₂ nanoparticles with a particle size of a few nm and depositing a nanoporous film by pulsed laser deposition with controlling the ambient gas pressure. However, the details of the formation process of SiO₂ nanoparticles have not been clarified. In this study, we visualized the time-resolved nanoparticle distribution in the gas phase by laser imaging technique to clarify the nanoparticle formation process and to be helpful for optimizing the growth condition of the low-k nanoporous film.

Original language	English
Title of host publication	Laser-Based Micro- and Nanoprocessing XV
Editors	Udo Klotzbach, Akira Watanabe, Rainer Kling
Publisher	SPIE
ISBN (Electronic)	9781510641839
DOIs	https://doi.org/10.1117/12.2576843
Publication status	Published - 2021
Event	Laser-Based Micro- and Nanoprocessing XV 2021 - Virtual, Online, United States Duration: Mar 6 2021 → Mar 11 2021

Publication series

Name	Proceedings of SPIE - The International Society for Optical Engineering
Volume	11674
ISSN (Print)	0277-786X
ISSN (Electronic)	1996-756X

Conference

Conference	Laser-Based Micro- and Nanoprocessing XV 2021
Country/Territory	United States
City	Virtual, Online
Period	3/6/21 → 3/11/21

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

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10.1117/12.2576843

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Suzuki, R., Koike, R., Katayama, K., Higashihata, M., Ikenoue, H., & Nakamura, D. (2021). Fabrication of nanoparticles of oxide materials by UV pulsed laser ablation in gas phase. In U. Klotzbach, A. Watanabe, & R. Kling (Eds.), Laser-Based Micro- and Nanoprocessing XV Article 116741G (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 11674). SPIE. https://doi.org/10.1117/12.2576843

Fabrication of nanoparticles of oxide materials by UV pulsed laser ablation in gas phase. / Suzuki, Rio; Koike, Reiji; Katayama, Keita et al.
Laser-Based Micro- and Nanoprocessing XV. ed. / Udo Klotzbach; Akira Watanabe; Rainer Kling. SPIE, 2021. 116741G (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 11674).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Suzuki, R, Koike, R, Katayama, K, Higashihata, M, Ikenoue, H & Nakamura, D 2021, Fabrication of nanoparticles of oxide materials by UV pulsed laser ablation in gas phase. in U Klotzbach, A Watanabe & R Kling (eds), Laser-Based Micro- and Nanoprocessing XV., 116741G, Proceedings of SPIE - The International Society for Optical Engineering, vol. 11674, SPIE, Laser-Based Micro- and Nanoprocessing XV 2021, Virtual, Online, United States, 3/6/21. https://doi.org/10.1117/12.2576843

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abstract = "SiO2 nanoporous films has been attracting attention as low-k dielectric constant insulating films. We have succeeded in SiO2 nanoparticles with a particle size of a few nm and depositing a nanoporous film by pulsed laser deposition with controlling the ambient gas pressure. However, the details of the formation process of SiO2 nanoparticles have not been clarified. In this study, we visualized the time-resolved nanoparticle distribution in the gas phase by laser imaging technique to clarify the nanoparticle formation process and to be helpful for optimizing the growth condition of the low-k nanoporous film.",

author = "Rio Suzuki and Reiji Koike and Keita Katayama and Mitsuhiro Higashihata and Hiroshi Ikenoue and Daisuke Nakamura",

year = "2021",

doi = "10.1117/12.2576843",

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AU - Ikenoue, Hiroshi

AU - Nakamura, Daisuke

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N2 - SiO2 nanoporous films has been attracting attention as low-k dielectric constant insulating films. We have succeeded in SiO2 nanoparticles with a particle size of a few nm and depositing a nanoporous film by pulsed laser deposition with controlling the ambient gas pressure. However, the details of the formation process of SiO2 nanoparticles have not been clarified. In this study, we visualized the time-resolved nanoparticle distribution in the gas phase by laser imaging technique to clarify the nanoparticle formation process and to be helpful for optimizing the growth condition of the low-k nanoporous film.

AB - SiO2 nanoporous films has been attracting attention as low-k dielectric constant insulating films. We have succeeded in SiO2 nanoparticles with a particle size of a few nm and depositing a nanoporous film by pulsed laser deposition with controlling the ambient gas pressure. However, the details of the formation process of SiO2 nanoparticles have not been clarified. In this study, we visualized the time-resolved nanoparticle distribution in the gas phase by laser imaging technique to clarify the nanoparticle formation process and to be helpful for optimizing the growth condition of the low-k nanoporous film.

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Fabrication of nanoparticles of oxide materials by UV pulsed laser ablation in gas phase

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