Abstract
A method for fabricating a microstructure with a high aspect ratio has been developed. It uses a combination of fluorinated polyimide and silicone-based positive photoresist, which reduces the number of process steps and the turn-around time. This fabrication method is applicable to optical micromachines and IC probes.
| Original language | English |
|---|---|
| Pages (from-to) | 165-168 |
| Number of pages | 4 |
| Journal | Microsystem Technologies |
| Volume | 6 |
| Issue number | 5 |
| DOIs | |
| Publication status | Published - Aug 2000 |
| Externally published | Yes |
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Hardware and Architecture
- Electrical and Electronic Engineering