Abstract
The fabrication process of a microcantilever with a silicon tip prepared by anodization for an atomic force microscope(AFM) is demonstrated. The silicon tip having a high aspect ratio can be prepared using preferential anodization of a silicon wafer with n / p junction. The microcantilever is fabricated by patterning a silicon nitride film deposited on the anodized wafer. The silicon tip is examined by observing the surface morphology of an anisotropically etched silicon step and the grains of a vacuum evaporated Au film.
| Original language | English |
|---|---|
| Pages (from-to) | 7078-7080 |
| Number of pages | 3 |
| Journal | Japanese Journal of Applied Physics |
| Volume | 37 |
| Issue number | 12 B |
| DOIs | |
| Publication status | Published - 1998 |
All Science Journal Classification (ASJC) codes
- General Engineering
- General Physics and Astronomy
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