Fabrication of carbon-based field emitters using stamp technology

Akiyoshi Baba; Masafumi Hizukuri; Masakazu Iwamoto; Tanemasa Asano

doi:10.1143/jjap.38.7203

Fabrication of carbon-based field emitters using stamp technology

Akiyoshi Baba, Masafumi Hizukuri, Masakazu Iwamoto, Tanemasa Asano

Center for Japan-Egypt Cooperation in Science and Technology（E-JUST Center）

Research output: Contribution to journal › Article › peer-review

19 Citations (Scopus)

Abstract

We propose and demonstrate stamp technology, a novel processing technique for a field electron emitter, in which emitter tips are fabricated by pressing a mold into a spin-coated organic material to completely transform the shape of the mold. The material is then modified by ion irradiation to produce a carbon-based emitter material. Starting materials tested were a high-temperature-cured polyimide and a photoresist (novolac resin). The shape of the mold can be completely transferred to these materials at pressure over 700 MPa at 250°C. A field-emission current up to the order of μA is obtained from emitters fabricated by this new technology with modification using Ar-ion irradiation at an energy of 100 keV to a dose of 3 × 10¹⁶cm^-2. The ion-beam-irradiation effect on polyimide and photoresist materials is also investigated in terms of electrical conductivity and chemical bonds.

Original language	English
Pages (from-to)	7203-7207
Number of pages	5
Journal	Japanese Journal of Applied Physics
Volume	38
Issue number	12 B
DOIs	https://doi.org/10.1143/jjap.38.7203
Publication status	Published - 1999

All Science Journal Classification (ASJC) codes

Engineering(all)
Physics and Astronomy(all)

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@article{04c2fc62291749be8118bba06cc48e75,

title = "Fabrication of carbon-based field emitters using stamp technology",

abstract = "We propose and demonstrate stamp technology, a novel processing technique for a field electron emitter, in which emitter tips are fabricated by pressing a mold into a spin-coated organic material to completely transform the shape of the mold. The material is then modified by ion irradiation to produce a carbon-based emitter material. Starting materials tested were a high-temperature-cured polyimide and a photoresist (novolac resin). The shape of the mold can be completely transferred to these materials at pressure over 700 MPa at 250°C. A field-emission current up to the order of μA is obtained from emitters fabricated by this new technology with modification using Ar-ion irradiation at an energy of 100 keV to a dose of 3 × 1016cm-2. The ion-beam-irradiation effect on polyimide and photoresist materials is also investigated in terms of electrical conductivity and chemical bonds.",

author = "Akiyoshi Baba and Masafumi Hizukuri and Masakazu Iwamoto and Tanemasa Asano",

year = "1999",

doi = "10.1143/jjap.38.7203",

language = "English",

volume = "38",

pages = "7203--7207",

journal = "Japanese Journal of Applied Physics",

issn = "0021-4922",

publisher = "The Japan Society of Applied Physics",

number = "12 B",

}

TY - JOUR

T1 - Fabrication of carbon-based field emitters using stamp technology

AU - Baba, Akiyoshi

AU - Hizukuri, Masafumi

AU - Iwamoto, Masakazu

AU - Asano, Tanemasa

PY - 1999

Y1 - 1999

N2 - We propose and demonstrate stamp technology, a novel processing technique for a field electron emitter, in which emitter tips are fabricated by pressing a mold into a spin-coated organic material to completely transform the shape of the mold. The material is then modified by ion irradiation to produce a carbon-based emitter material. Starting materials tested were a high-temperature-cured polyimide and a photoresist (novolac resin). The shape of the mold can be completely transferred to these materials at pressure over 700 MPa at 250°C. A field-emission current up to the order of μA is obtained from emitters fabricated by this new technology with modification using Ar-ion irradiation at an energy of 100 keV to a dose of 3 × 1016cm-2. The ion-beam-irradiation effect on polyimide and photoresist materials is also investigated in terms of electrical conductivity and chemical bonds.

AB - We propose and demonstrate stamp technology, a novel processing technique for a field electron emitter, in which emitter tips are fabricated by pressing a mold into a spin-coated organic material to completely transform the shape of the mold. The material is then modified by ion irradiation to produce a carbon-based emitter material. Starting materials tested were a high-temperature-cured polyimide and a photoresist (novolac resin). The shape of the mold can be completely transferred to these materials at pressure over 700 MPa at 250°C. A field-emission current up to the order of μA is obtained from emitters fabricated by this new technology with modification using Ar-ion irradiation at an energy of 100 keV to a dose of 3 × 1016cm-2. The ion-beam-irradiation effect on polyimide and photoresist materials is also investigated in terms of electrical conductivity and chemical bonds.

UR - http://www.scopus.com/inward/record.url?scp=0033309865&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0033309865&partnerID=8YFLogxK

U2 - 10.1143/jjap.38.7203

DO - 10.1143/jjap.38.7203

M3 - Article

AN - SCOPUS:0033309865

SN - 0021-4922

VL - 38

SP - 7203

EP - 7207

JO - Japanese Journal of Applied Physics

JF - Japanese Journal of Applied Physics

IS - 12 B

ER -

Fabrication of carbon-based field emitters using stamp technology

Abstract

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