Fabrication and evaluation of trimethylmethoxysilane (TMMOS)-derived membranes for gas separation

Yoshihiro Mise, So Jin Ahn, Atsushi Takagaki, Ryuji Kikuchi, Shigeo Ted Oyama

    Research output: Contribution to journalArticlepeer-review

    7 Citations (Scopus)


    Gas separation membranes were fabricated with varying trimethylmethoxysilane (TMMOS)/tetraethoxy orthosilicate (TEOS) ratios by a chemical vapor deposition (CVD) method at 650 °C and atmospheric pressure. The membrane had a high H2 permeance of 8.3 × 10-7 mol m-2 s-1 Pa-1 with H2/CH4 selectivity of 140 and H2/C2H6 selectivity of 180 at 300 °C. Fourier transform infrared (FTIR) measurements indicated existence of methyl groups at high preparation temperature (650 °C), which led to a higher hydrothermal stability of the TMMOS-derived membranes than of a pure TEOS-derived membrane. Temperature-dependence measurements of the permeance of various gas species were used to establish a permeation mechanism. It was found that smaller species (He, H2, and Ne) followed a solid-state diffusion model while larger species (N2, CO2, and CH4) followed a gas translational diffusion model.

    Original languageEnglish
    Article number123
    Issue number10
    Publication statusPublished - Oct 2019

    All Science Journal Classification (ASJC) codes

    • Chemical Engineering (miscellaneous)
    • Process Chemistry and Technology
    • Filtration and Separation


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