Evaluation of alignment error of micropore X-ray optics caused by hot plastic deformation

Masaki Numazawa, Daiki Ishi, Yuichiro Ezoe, Kazuma Takeuchi, Masaru Terada, Maiko Fujitani, Kumi Ishikawa, Kazuo Nakajima, Kohei Morishita, Takaya Ohashi, Kazuhisa Mitsuda, Kasumi Nakamura, Yusuke Noda

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3 Citations (Scopus)


We report on the evaluation and characterization of micro-electromechanical system (MEMS) X-ray optics produced by silicon dry etching and hot plastic deformation. Sidewalls of micropores formed by etching through a silicon wafer are used as X-ray reflecting mirrors. The wafer is deformed into a spherical shape to focus parallel incidence X-rays. We quantitatively evaluated a mirror alignment error using an X-ray pencil beam (Al Kα line at 1.49 keV). The deviation angle caused only by the deformation was estimated from angular shifts of the X-ray focusing point before and after the deformation to be 2.7 ± 0.3 arcmin on average within the optics. This gives an angular resolution of 12.9 ± 1.4 arcmin in half-power diameter (HPD). The surface profile of the deformed optics measured using a NH-3Ns surface profiler (Mitaka Kohki) also indicated that the resolution was 11.4 ± 0.9 arcmin in HPD, suggesting that we can simply evaluate the alignment error caused by the hot plastic deformation.

Original languageEnglish
Article number06HJ11
JournalJapanese journal of applied physics
Issue number6
Publication statusPublished - Jun 2018
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)


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