TY - JOUR
T1 - Estimation of negative ions in VHF SiH4/H2 plasma
AU - Yamane, Tsukasa
AU - Nakano, Shinya
AU - Nakao, Sachiko
AU - Takeuchi, Yoshiaki
AU - Ichiki, Ryuta
AU - Muta, Hiroshi
AU - Uchino, Kiichiro
AU - Kawai, Yoshinobu
N1 - Publisher Copyright:
© 2014 The Japan Society of Applied Physics.
PY - 2014/11/1
Y1 - 2014/11/1
N2 - The characteristics of a VHF SiH4/H2 plasma (frequency: 60 MHz) at high pressures were examined as a function of silane concentration with a heated Langmuir probe. Anomalous reductions in electron saturation current were observed, suggesting the existence of many negative ions. An estimation of the concentration of negative ions was attempted using the sheath theory including negative ions. It was found that there exist H- and SiH3- ions as dominant negative ions in the VHF SiH4/H2 plasma. In addition, the measured floating potential agreed with the theoretical value.
AB - The characteristics of a VHF SiH4/H2 plasma (frequency: 60 MHz) at high pressures were examined as a function of silane concentration with a heated Langmuir probe. Anomalous reductions in electron saturation current were observed, suggesting the existence of many negative ions. An estimation of the concentration of negative ions was attempted using the sheath theory including negative ions. It was found that there exist H- and SiH3- ions as dominant negative ions in the VHF SiH4/H2 plasma. In addition, the measured floating potential agreed with the theoretical value.
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U2 - 10.7567/JJAP.53.116101
DO - 10.7567/JJAP.53.116101
M3 - Article
AN - SCOPUS:84909952789
SN - 0021-4922
VL - 53
JO - Japanese journal of applied physics
JF - Japanese journal of applied physics
IS - 11
M1 - 116101
ER -