Epitaxial Growth of Ferromagnetic Silicide Fe3Si on Si(111) Substrate (Special Issue: Solid State Devices & Materials)

Taizoh Sadoh, Hisashi Takeuchi, Koji Ueda, Atsushi Kenjo, Masanobu Miyao

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	3598-3600
Number of pages	3
Journal	Japanese Journal of Applied Physics, Part 2: Letters
Volume	45
Issue number	4
Publication status	Published - Apr 2006

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title = "Epitaxial Growth of Ferromagnetic Silicide Fe3Si on Si(111) Substrate (Special Issue: Solid State Devices & Materials)",

author = "Taizoh Sadoh and Hisashi Takeuchi and Koji Ueda and Atsushi Kenjo and Masanobu Miyao",

year = "2006",

month = apr,

language = "English",

volume = "45",

pages = "3598--3600",

journal = "Japanese Journal of Applied Physics, Part 2: Letters",

issn = "0021-4922",

publisher = "IOP Publishing Ltd.",

number = "4",

}

TY - JOUR

T1 - Epitaxial Growth of Ferromagnetic Silicide Fe3Si on Si(111) Substrate (Special Issue

T2 - Solid State Devices & Materials)

AU - Sadoh, Taizoh

AU - Takeuchi, Hisashi

AU - Ueda, Koji

AU - Kenjo, Atsushi

AU - Miyao, Masanobu

PY - 2006/4

Y1 - 2006/4

M3 - Article

SN - 0021-4922

VL - 45

SP - 3598

EP - 3600

JO - Japanese Journal of Applied Physics, Part 2: Letters

JF - Japanese Journal of Applied Physics, Part 2: Letters

IS - 4

ER -