TY - JOUR
T1 - Enlargement of Kinetic Inductance of NbN Superconducting Thin Films for Device Applications
AU - Hossain, Mohammad Sajjad
AU - Yoshida, Keiji
AU - Kudo, Keisuke
AU - Enpuku, Keiji
AU - Yamafuji, Kaoru
PY - 1992/4
Y1 - 1992/4
N2 - Experimental studies to enlarge kinetic inductance of NbN thin films using the effects of quality and thickness of the film are made by measuring Fiske current steps in the current-voltage (I-V) characteristics of NbN/Pb-In Josephson junctions. Experiments demonstrate that the specific kinetic inductance LK can be enlarged over a wide range by changing stoichiometry of the film, as well as by making the film thickness thin, and that this enlargement becomes larger by both effects when the film thickness is in an ultra thin regime. This inductance is shown to be well fitted to LK=µ0λ2/d, where µ_0 isthevacuumpermeability, d isthethickness, and λ isthemagneticpenetrationdepthinthedirtylimit. Inthepresentexperimentweattainedtheinductanceashighas L_K=130 pHbythecombinedeffectsofimpurityandthicknessforafilmwith d=30 nm.
AB - Experimental studies to enlarge kinetic inductance of NbN thin films using the effects of quality and thickness of the film are made by measuring Fiske current steps in the current-voltage (I-V) characteristics of NbN/Pb-In Josephson junctions. Experiments demonstrate that the specific kinetic inductance LK can be enlarged over a wide range by changing stoichiometry of the film, as well as by making the film thickness thin, and that this enlargement becomes larger by both effects when the film thickness is in an ultra thin regime. This inductance is shown to be well fitted to LK=µ0λ2/d, where µ_0 isthevacuumpermeability, d isthethickness, and λ isthemagneticpenetrationdepthinthedirtylimit. Inthepresentexperimentweattainedtheinductanceashighas L_K=130 pHbythecombinedeffectsofimpurityandthicknessforafilmwith d=30 nm.
UR - http://www.scopus.com/inward/record.url?scp=0026852902&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=0026852902&partnerID=8YFLogxK
U2 - 10.1143/JJAP.31.1033
DO - 10.1143/JJAP.31.1033
M3 - Article
AN - SCOPUS:0026852902
SN - 0021-4922
VL - 31
SP - 1033
EP - 1038
JO - Japanese journal of applied physics
JF - Japanese journal of applied physics
IS - 4 R
ER -