Enhancement of critical current density in ErBa2Cu 3Oy thin films by post-annealing

Shigeru Horii; Ataru Ichinose; Masashi Mukaida; Kaname Matsumoto; Tohru Ohazama; Yutaka Yoshida; Jun Ichi Shimoyama; Kohji Kishio

doi:10.1143/JJAP.43.L1223

Enhancement of critical current density in ErBa₂Cu ₃O_y thin films by post-annealing

Shigeru Horii, Ataru Ichinose, Masashi Mukaida, Kaname Matsumoto, Tohru Ohazama, Yutaka Yoshida, Jun Ichi Shimoyama, Kohji Kishio

Research output: Contribution to journal › Article › peer-review

23 Citations (Scopus)

Abstract

We report a remarkable increase in critical current density (J_c) by oxygen post-annealing for only a few tens of minutes in ErBa ₂Cu₃O_y films fabricated at two different pulsed-laser-deposition (PLD) temperatures of 720°C and 760°C. The J_c of these films were obviously enhanced to more than 1 MA·cm^-2 in the annealing temperature range of 350°C-500°C in comparison with those of the as-deposited films (0.3-0.5 MA·cm^-2). Even in a nonequilibrium process such as the PLD method, the homogenization of oxygen contents in films is crucial for enhancement of the films' critical current properties, which suggests that oxygen post-annealing is a practical process for improvement of critical current of PLD-REBa₂Cu₃O_y coated conductors.

Original language	English
Pages (from-to)	L1223-L1225
Journal	Japanese Journal of Applied Physics
Volume	43
Issue number	9 AB
DOIs	https://doi.org/10.1143/JJAP.43.L1223
Publication status	Published - Sept 15 2004
Externally published	Yes

All Science Journal Classification (ASJC) codes

Engineering(all)
Physics and Astronomy(all)

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10.1143/JJAP.43.L1223

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title = "Enhancement of critical current density in ErBa2Cu 3Oy thin films by post-annealing",

abstract = "We report a remarkable increase in critical current density (Jc) by oxygen post-annealing for only a few tens of minutes in ErBa 2Cu3Oy films fabricated at two different pulsed-laser-deposition (PLD) temperatures of 720°C and 760°C. The Jc of these films were obviously enhanced to more than 1 MA·cm-2 in the annealing temperature range of 350°C-500°C in comparison with those of the as-deposited films (0.3-0.5 MA·cm-2). Even in a nonequilibrium process such as the PLD method, the homogenization of oxygen contents in films is crucial for enhancement of the films' critical current properties, which suggests that oxygen post-annealing is a practical process for improvement of critical current of PLD-REBa2Cu3Oy coated conductors.",

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T1 - Enhancement of critical current density in ErBa2Cu 3Oy thin films by post-annealing

AU - Horii, Shigeru

AU - Ichinose, Ataru

AU - Mukaida, Masashi

AU - Matsumoto, Kaname

AU - Ohazama, Tohru

AU - Yoshida, Yutaka

AU - Shimoyama, Jun Ichi

AU - Kishio, Kohji

PY - 2004/9/15

Y1 - 2004/9/15

N2 - We report a remarkable increase in critical current density (Jc) by oxygen post-annealing for only a few tens of minutes in ErBa 2Cu3Oy films fabricated at two different pulsed-laser-deposition (PLD) temperatures of 720°C and 760°C. The Jc of these films were obviously enhanced to more than 1 MA·cm-2 in the annealing temperature range of 350°C-500°C in comparison with those of the as-deposited films (0.3-0.5 MA·cm-2). Even in a nonequilibrium process such as the PLD method, the homogenization of oxygen contents in films is crucial for enhancement of the films' critical current properties, which suggests that oxygen post-annealing is a practical process for improvement of critical current of PLD-REBa2Cu3Oy coated conductors.

AB - We report a remarkable increase in critical current density (Jc) by oxygen post-annealing for only a few tens of minutes in ErBa 2Cu3Oy films fabricated at two different pulsed-laser-deposition (PLD) temperatures of 720°C and 760°C. The Jc of these films were obviously enhanced to more than 1 MA·cm-2 in the annealing temperature range of 350°C-500°C in comparison with those of the as-deposited films (0.3-0.5 MA·cm-2). Even in a nonequilibrium process such as the PLD method, the homogenization of oxygen contents in films is crucial for enhancement of the films' critical current properties, which suggests that oxygen post-annealing is a practical process for improvement of critical current of PLD-REBa2Cu3Oy coated conductors.

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Enhancement of critical current density in ErBa₂Cu ₃O_y thin films by post-annealing

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