Electron emission characteristics of metal/diamond field emitters

Takashi Sugino, Yukio Iwasaki, Seiji Kawasaki, Reiji Hattori, Junji Shirafuji

Research output: Contribution to journalArticlepeer-review

30 Citations (Scopus)


Electron emission characteristics have been investigated for polycrystalline diamond films with negative electron affinity. Phosphorus-doped diamond films are deposited on Si wafers and Cu plates by hot-filament chemical vapor deposition. An Al/diamond contact is formed on the rear side of the diamond film after removing Si substrates. A significant reduction in the applied electric field for the electron emission is achieved by forming Cu/diamond and Al/diamond contacts in comparison to that of diamond on Si. It is revealed that the electron emission characteristics are dominated by electrons injected into the diamond at the metal/diamond contact.

Original languageEnglish
Pages (from-to)889-892
Number of pages4
JournalDiamond and Related Materials
Issue number5-7
Publication statusPublished - Apr 1997
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Chemistry(all)
  • Mechanical Engineering
  • Materials Chemistry
  • Electrical and Electronic Engineering


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