Electrodeposition of metallic tungsten in ZnCl2-NaCl-KCl- WCl4 melt at 250°C

Hironori Nakajima; Toshiyuki Nohira; Rika Hagiwara

doi:10.1149/1.1921130

Electrodeposition of metallic tungsten in ZnCl₂-NaCl-KCl- WCl₄ melt at 250°C

Hironori Nakajima, Toshiyuki Nohira, Rika Hagiwara

Research output: Contribution to journal › Article › peer-review

33 Citations (Scopus)

Abstract

Metallic tungsten film has been obtained by potentiostatic electrolysis in ZnCl₂-NaCl-KCl (0.60:0.20:0.20, in mole fraction) melt containing WCl₄ at 250°C. The deposit obtained after the electrolysis at 0.02 V vs. Zn(II)/Zn for 3 h was ca. 0.5 μm thick and the surface was not smooth. On the other hand, addition of 4 mol % of KF to the melt gave a smooth metal deposit ca. 0.5 μm thick in the same condition as above.

Original language	English
Pages (from-to)	C91-C94
Journal	Electrochemical and Solid-State Letters
Volume	8
Issue number	7
DOIs	https://doi.org/10.1149/1.1921130
Publication status	Published - 2005
Externally published	Yes

All Science Journal Classification (ASJC) codes

Chemical Engineering(all)
Materials Science(all)
Physical and Theoretical Chemistry
Electrochemistry
Electrical and Electronic Engineering

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10.1149/1.1921130

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title = "Electrodeposition of metallic tungsten in ZnCl2-NaCl-KCl- WCl4 melt at 250°C",

abstract = "Metallic tungsten film has been obtained by potentiostatic electrolysis in ZnCl2-NaCl-KCl (0.60:0.20:0.20, in mole fraction) melt containing WCl4 at 250°C. The deposit obtained after the electrolysis at 0.02 V vs. Zn(II)/Zn for 3 h was ca. 0.5 μm thick and the surface was not smooth. On the other hand, addition of 4 mol % of KF to the melt gave a smooth metal deposit ca. 0.5 μm thick in the same condition as above.",

author = "Hironori Nakajima and Toshiyuki Nohira and Rika Hagiwara",

year = "2005",

doi = "10.1149/1.1921130",

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volume = "8",

pages = "C91--C94",

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T1 - Electrodeposition of metallic tungsten in ZnCl2-NaCl-KCl- WCl4 melt at 250°C

AU - Nakajima, Hironori

AU - Nohira, Toshiyuki

AU - Hagiwara, Rika

PY - 2005

Y1 - 2005

N2 - Metallic tungsten film has been obtained by potentiostatic electrolysis in ZnCl2-NaCl-KCl (0.60:0.20:0.20, in mole fraction) melt containing WCl4 at 250°C. The deposit obtained after the electrolysis at 0.02 V vs. Zn(II)/Zn for 3 h was ca. 0.5 μm thick and the surface was not smooth. On the other hand, addition of 4 mol % of KF to the melt gave a smooth metal deposit ca. 0.5 μm thick in the same condition as above.

AB - Metallic tungsten film has been obtained by potentiostatic electrolysis in ZnCl2-NaCl-KCl (0.60:0.20:0.20, in mole fraction) melt containing WCl4 at 250°C. The deposit obtained after the electrolysis at 0.02 V vs. Zn(II)/Zn for 3 h was ca. 0.5 μm thick and the surface was not smooth. On the other hand, addition of 4 mol % of KF to the melt gave a smooth metal deposit ca. 0.5 μm thick in the same condition as above.

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JO - Electrochemical and Solid-State Letters

JF - Electrochemical and Solid-State Letters

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Electrodeposition of metallic tungsten in ZnCl₂-NaCl-KCl- WCl₄ melt at 250°C

Abstract

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