Electrodeposition of metallic molybdenum films in ZnCl2-NaCl-KCl-MoCl3 systems at 250 °C

Hironori Nakajima; Toshiyuki Nohira; Rika Hagiwara

doi:10.1016/j.electacta.2005.10.041

Electrodeposition of metallic molybdenum films in ZnCl₂-NaCl-KCl-MoCl₃ systems at 250 °C

Hironori Nakajima, Toshiyuki Nohira, Rika Hagiwara

Research output: Contribution to journal › Article › peer-review

22 Citations (Scopus)

Abstract

Molybdenum metal film has been electrodeposited in ZnCl₂-NaCl-KCl (0.60:0.20:0.20, in mole fraction) melt containing MoCl₃ at 250 °C. In this melt, a dense film was obtained by potentiostatic electrolysis at 0.15 V versus Zn(II)/Zn for 3 h. However, the film had a thickness of smaller than 0.5 μm and was not adhesive. On the other hand, addition of 4 mol% of KF to the melt led to larger cathodic current in cyclic voltammogram, and gave a dense, adhesive and thicker metal film of ca. 3 μm thickness in the same electrolysis condition as above. The present process is promising as a new method for molybdenum coating at low temperatures.

Original language	English
Pages (from-to)	3776-3780
Number of pages	5
Journal	Electrochimica Acta
Volume	51
Issue number	18
DOIs	https://doi.org/10.1016/j.electacta.2005.10.041
Publication status	Published - May 5 2006
Externally published	Yes

All Science Journal Classification (ASJC) codes

Chemical Engineering(all)
Electrochemistry

Access to Document

10.1016/j.electacta.2005.10.041

Cite this

@article{779130587c9e41aca65e4a9e6d8cefde,

title = "Electrodeposition of metallic molybdenum films in ZnCl2-NaCl-KCl-MoCl3 systems at 250 °C",

abstract = "Molybdenum metal film has been electrodeposited in ZnCl2-NaCl-KCl (0.60:0.20:0.20, in mole fraction) melt containing MoCl3 at 250 °C. In this melt, a dense film was obtained by potentiostatic electrolysis at 0.15 V versus Zn(II)/Zn for 3 h. However, the film had a thickness of smaller than 0.5 μm and was not adhesive. On the other hand, addition of 4 mol% of KF to the melt led to larger cathodic current in cyclic voltammogram, and gave a dense, adhesive and thicker metal film of ca. 3 μm thickness in the same electrolysis condition as above. The present process is promising as a new method for molybdenum coating at low temperatures.",

author = "Hironori Nakajima and Toshiyuki Nohira and Rika Hagiwara",

year = "2006",

month = may,

day = "5",

doi = "10.1016/j.electacta.2005.10.041",

language = "English",

volume = "51",

pages = "3776--3780",

journal = "Electrochimica Acta",

issn = "0013-4686",

publisher = "Elsevier Limited",

number = "18",

}

TY - JOUR

T1 - Electrodeposition of metallic molybdenum films in ZnCl2-NaCl-KCl-MoCl3 systems at 250 °C

AU - Nakajima, Hironori

AU - Nohira, Toshiyuki

AU - Hagiwara, Rika

PY - 2006/5/5

Y1 - 2006/5/5

N2 - Molybdenum metal film has been electrodeposited in ZnCl2-NaCl-KCl (0.60:0.20:0.20, in mole fraction) melt containing MoCl3 at 250 °C. In this melt, a dense film was obtained by potentiostatic electrolysis at 0.15 V versus Zn(II)/Zn for 3 h. However, the film had a thickness of smaller than 0.5 μm and was not adhesive. On the other hand, addition of 4 mol% of KF to the melt led to larger cathodic current in cyclic voltammogram, and gave a dense, adhesive and thicker metal film of ca. 3 μm thickness in the same electrolysis condition as above. The present process is promising as a new method for molybdenum coating at low temperatures.

AB - Molybdenum metal film has been electrodeposited in ZnCl2-NaCl-KCl (0.60:0.20:0.20, in mole fraction) melt containing MoCl3 at 250 °C. In this melt, a dense film was obtained by potentiostatic electrolysis at 0.15 V versus Zn(II)/Zn for 3 h. However, the film had a thickness of smaller than 0.5 μm and was not adhesive. On the other hand, addition of 4 mol% of KF to the melt led to larger cathodic current in cyclic voltammogram, and gave a dense, adhesive and thicker metal film of ca. 3 μm thickness in the same electrolysis condition as above. The present process is promising as a new method for molybdenum coating at low temperatures.

UR - http://www.scopus.com/inward/record.url?scp=33646088114&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=33646088114&partnerID=8YFLogxK

U2 - 10.1016/j.electacta.2005.10.041

DO - 10.1016/j.electacta.2005.10.041

M3 - Article

AN - SCOPUS:33646088114

SN - 0013-4686

VL - 51

SP - 3776

EP - 3780

JO - Electrochimica Acta

JF - Electrochimica Acta

IS - 18

ER -

Electrodeposition of metallic molybdenum films in ZnCl₂-NaCl-KCl-MoCl₃ systems at 250 °C

Abstract

All Science Journal Classification (ASJC) codes

Access to Document

Other files and links

Fingerprint

Cite this