Efficient photocatalytic fixation of N2 by KOH-treated g-C3N4

Xiaoman Li, Xiang Sun, Ling Zhang, Songmei Sun, Wenzhong Wang

    Research output: Contribution to journalArticlepeer-review

    132 Citations (Scopus)


    Development of N2 photofixation under mild conditions is challenging; one reason for low efficiency is the poor reactivity between water and photocatalysts. Herein, C3N4 after KOH etching was used as an efficient photocatalyst, and CH3OH was first introduced as a proton source. The photocatalyst presented a high ammonia evolution rate of 3.632 mmol g-1 h-1 and achieved an apparent quantum yield of 21.5% at ∼420 nm. In addition to the role of reacting with holes to accelerate the production and transfer of electrons, CH3OH also promoted the solubility of N2 and provided a proton to the activated N2. The CH3OH system should be instructive for a better understanding of proton-enhanced photocatalysis.

    Original languageEnglish
    Pages (from-to)3005-3011
    Number of pages7
    JournalJournal of Materials Chemistry A
    Issue number7
    Publication statusPublished - 2018

    All Science Journal Classification (ASJC) codes

    • Chemistry(all)
    • Renewable Energy, Sustainability and the Environment
    • Materials Science(all)


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