Effects of resist thickness and viscoelasticity on the cavity filling capability in bilayer thermal embossing (Special issue: Microprocesses and nanotechnology)

Y. Xu; Fujio Tsumori; Takuya Toyooka

Effects of resist thickness and viscoelasticity on the cavity filling capability in bilayer thermal embossing (Special issue: Microprocesses and nanotechnology)

Y. Xu, Fujio Tsumori, Takuya Toyooka

Manufacturing Process

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	06GK11-1〜5
Journal	Japanese Journal of Applied Physics, Part 2: Letters
Volume	50
Issue number	6
Publication status	Published - Jun 2011

Access to Document

http://id.ndl.go.jp/bib/11131204

Cite this

Effects of resist thickness and viscoelasticity on the cavity filling capability in bilayer thermal embossing (Special issue: Microprocesses and nanotechnology). / Xu, Y.; Tsumori, Fujio; Toyooka, Takuya.
In: Japanese Journal of Applied Physics, Part 2: Letters, Vol. 50, No. 6, 06.2011, p. 06GK11-1〜5.

Research output: Contribution to journal › Article › peer-review

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