Effects of photoirradiation in UV and VUV regions during plasma exposure to polymers

Ken Cho, Yuichi Setsuhara, Kosuke Takenaka, Masaharu Shiratani, Makoto Sekine, Masaru Hori

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15 Citations (Scopus)


Interactions between photons irradiated from Ar-O2 mixture plasmas and polymer surfaces were investigated on the basis of depth analyses of chemical bonding states in the nano-surface layer of polyethylene terephthalate (PET) films via hard X-ray photoelectron spectroscopy (HXPES) and conventional X-ray photoelectron spectroscopy (XPS). The PET films were exposed to photons from the Ar-O2 mixture plasmas by covering the PET samples with MgF2 and quartz windows as optical filters for evaluation of photoirradiation effects in ultraviolet (UV) and vacuum ultraviolet (VUV) regions. The HXPES results indicated that the degradation of the chemical bonding states due to photoirradiation in regions was insignificant in deeper regions up to about 50 nm from the surface. Whereas, conventional XPS analysis showed that CO bond, OCO bond and CO bond increased after photoirradiation in UV and VUV regions. These results suggest that the increase in oxygen functionalities (CO bond, OCO bond and CO bond) may be attributed to chemical reactions and/or terminations of scissed bonds via photodecompositions of the polymer with oxygen and/or OH species (oxygen molecules and radicals during plasma exposure and/or oxygen molecules and moisture after taking the PET samples out of the plasma reactor to the ambient air) in the vicinity of the sample surface.

Original languageEnglish
Pages (from-to)6810-6814
Number of pages5
JournalThin Solid Films
Issue number20
Publication statusPublished - Aug 1 2011

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry


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