Effects of N2/Ar gas ratio on phase formation and tribology of Ti-Si-N composite coatings prepared by hybrid PVD

Chan Young Park; Sung Min Lee; Seong Won Kim; Hyung Tae Kim; Byung Koog Jang; Yoon Suk Oh

doi:10.2109/jcersj2.122.638

Effects of N₂/Ar gas ratio on phase formation and tribology of Ti-Si-N composite coatings prepared by hybrid PVD

Chan Young Park, Sung Min Lee, Seong Won Kim, Hyung Tae Kim, Byung Koog Jang, Yoon Suk Oh

Research output: Contribution to journal › Article › peer-review

1 Citation (Scopus)

Abstract

Ti-Si-N hard coatings have been fabricated at different N₂/Ar gas ratio (N₂:Ar = 1:1, 1:2, or 1:3) sputtering conditions by the hybrid Physical Vapor Deposition (PVD) method, which consists of sputtering and arc ion plating (AIP). The pure silicon and titanium targets were selected for reactive sputtering and the AIP process, respectively. Field Emission Scanning Electron Microscopy (FESEM) and Energy Dispersive X-ray Spectroscopy (EDS) analysis has shown that the Ti/Si ratio increased as the Ar gas flow rate increased. Moreover, it found that the main growth plane of Ti-Si-N film was changed from (111) plane to (220) plane with increasing Ar gas flow from the results of X-ray diffraction (XRD) analysis. The wear rate of composite films was found to be lower than that of monolithic TiN with different friction coefficients at the initial running-in stage.

Original language	English
Pages (from-to)	638-641
Number of pages	4
Journal	Journal of the Ceramic Society of Japan
Volume	122
Issue number	1428
DOIs	https://doi.org/10.2109/jcersj2.122.638
Publication status	Published - Aug 1 2014
Externally published	Yes

All Science Journal Classification (ASJC) codes

Ceramics and Composites
Chemistry(all)
Condensed Matter Physics
Materials Chemistry

Access to Document

10.2109/jcersj2.122.638

Cite this

@article{362f9325f8f74e488d18868b251d831e,

title = "Effects of N2/Ar gas ratio on phase formation and tribology of Ti-Si-N composite coatings prepared by hybrid PVD",

abstract = "Ti-Si-N hard coatings have been fabricated at different N2/Ar gas ratio (N2:Ar = 1:1, 1:2, or 1:3) sputtering conditions by the hybrid Physical Vapor Deposition (PVD) method, which consists of sputtering and arc ion plating (AIP). The pure silicon and titanium targets were selected for reactive sputtering and the AIP process, respectively. Field Emission Scanning Electron Microscopy (FESEM) and Energy Dispersive X-ray Spectroscopy (EDS) analysis has shown that the Ti/Si ratio increased as the Ar gas flow rate increased. Moreover, it found that the main growth plane of Ti-Si-N film was changed from (111) plane to (220) plane with increasing Ar gas flow from the results of X-ray diffraction (XRD) analysis. The wear rate of composite films was found to be lower than that of monolithic TiN with different friction coefficients at the initial running-in stage.",

author = "Park, {Chan Young} and Lee, {Sung Min} and Kim, {Seong Won} and Kim, {Hyung Tae} and Jang, {Byung Koog} and Oh, {Yoon Suk}",

year = "2014",

month = aug,

day = "1",

doi = "10.2109/jcersj2.122.638",

language = "English",

volume = "122",

pages = "638--641",

journal = "Journal of the Ceramic Society of Japan",

issn = "1882-0743",

publisher = "Ceramic Society of Japan/Nippon Seramikkusu Kyokai",

number = "1428",

}

TY - JOUR

T1 - Effects of N2/Ar gas ratio on phase formation and tribology of Ti-Si-N composite coatings prepared by hybrid PVD

AU - Park, Chan Young

AU - Lee, Sung Min

AU - Kim, Seong Won

AU - Kim, Hyung Tae

AU - Jang, Byung Koog

AU - Oh, Yoon Suk

PY - 2014/8/1

Y1 - 2014/8/1

N2 - Ti-Si-N hard coatings have been fabricated at different N2/Ar gas ratio (N2:Ar = 1:1, 1:2, or 1:3) sputtering conditions by the hybrid Physical Vapor Deposition (PVD) method, which consists of sputtering and arc ion plating (AIP). The pure silicon and titanium targets were selected for reactive sputtering and the AIP process, respectively. Field Emission Scanning Electron Microscopy (FESEM) and Energy Dispersive X-ray Spectroscopy (EDS) analysis has shown that the Ti/Si ratio increased as the Ar gas flow rate increased. Moreover, it found that the main growth plane of Ti-Si-N film was changed from (111) plane to (220) plane with increasing Ar gas flow from the results of X-ray diffraction (XRD) analysis. The wear rate of composite films was found to be lower than that of monolithic TiN with different friction coefficients at the initial running-in stage.

AB - Ti-Si-N hard coatings have been fabricated at different N2/Ar gas ratio (N2:Ar = 1:1, 1:2, or 1:3) sputtering conditions by the hybrid Physical Vapor Deposition (PVD) method, which consists of sputtering and arc ion plating (AIP). The pure silicon and titanium targets were selected for reactive sputtering and the AIP process, respectively. Field Emission Scanning Electron Microscopy (FESEM) and Energy Dispersive X-ray Spectroscopy (EDS) analysis has shown that the Ti/Si ratio increased as the Ar gas flow rate increased. Moreover, it found that the main growth plane of Ti-Si-N film was changed from (111) plane to (220) plane with increasing Ar gas flow from the results of X-ray diffraction (XRD) analysis. The wear rate of composite films was found to be lower than that of monolithic TiN with different friction coefficients at the initial running-in stage.

UR - http://www.scopus.com/inward/record.url?scp=84906573011&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84906573011&partnerID=8YFLogxK

U2 - 10.2109/jcersj2.122.638

DO - 10.2109/jcersj2.122.638

M3 - Article

AN - SCOPUS:84906573011

SN - 1882-0743

VL - 122

SP - 638

EP - 641

JO - Journal of the Ceramic Society of Japan

JF - Journal of the Ceramic Society of Japan

IS - 1428

ER -

Effects of N₂/Ar gas ratio on phase formation and tribology of Ti-Si-N composite coatings prepared by hybrid PVD

Abstract

All Science Journal Classification (ASJC) codes

Access to Document

Other files and links

Fingerprint

Cite this