TY - JOUR
T1 - Effects of metal/Ge contact and surface passivation on direct band gap light emission and detection for asymmetric metal/Ge/metal diodes
AU - Maekura, Takayuki
AU - Yamamoto, Keisuke
AU - Nakashima, Hiroshi
AU - Wang, Dong
N1 - Funding Information:
This work was supported by JSPS KAKENHI Grant Number 26289090 and was partially supported by JSPS Core-to-Core Program, A. Advanced Research Networks
PY - 2016/4
Y1 - 2016/4
N2 - Direct band gap electroluminescence (EL) and light detection were studied at room temperature for n-type bulk germanium (Ge) by using fin-type asymmetric lateral metal/Ge/metal diodes. HfGe/Ge and PtGe/Ge contacts were used for injecting holes. Electron cyclotron resonance plasma oxidation and physical vapor deposition bilayer passivation (BLP) methods were employed for passivating the surface of the active region. A high EL intensity and a low dark current intensity were observed for the sample with PtGe/Ge contact and BLP, owing to the small/large barrier height of holes/electrons for PtGe/Ge contact, respectively, and the low density of interface states for the active region with BLP. The local-heatinginduced redshift of the EL peak for the sample with PtGe/Ge contact is smaller than that for the sample with HfGe/Ge contact, owing to the lower parasitic resistance of PtGe/Ge contact. The diode with PtGe/Ge contact and BLP shows an on/off ratio of >104 and a responsivity of 0.70A/W, corresponding to an external quantum efficiency of 56.0% under a wavelength of 1.55 μm.
AB - Direct band gap electroluminescence (EL) and light detection were studied at room temperature for n-type bulk germanium (Ge) by using fin-type asymmetric lateral metal/Ge/metal diodes. HfGe/Ge and PtGe/Ge contacts were used for injecting holes. Electron cyclotron resonance plasma oxidation and physical vapor deposition bilayer passivation (BLP) methods were employed for passivating the surface of the active region. A high EL intensity and a low dark current intensity were observed for the sample with PtGe/Ge contact and BLP, owing to the small/large barrier height of holes/electrons for PtGe/Ge contact, respectively, and the low density of interface states for the active region with BLP. The local-heatinginduced redshift of the EL peak for the sample with PtGe/Ge contact is smaller than that for the sample with HfGe/Ge contact, owing to the lower parasitic resistance of PtGe/Ge contact. The diode with PtGe/Ge contact and BLP shows an on/off ratio of >104 and a responsivity of 0.70A/W, corresponding to an external quantum efficiency of 56.0% under a wavelength of 1.55 μm.
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U2 - 10.7567/JJAP.55.04EH08
DO - 10.7567/JJAP.55.04EH08
M3 - Article
AN - SCOPUS:84963652886
SN - 0021-4922
VL - 55
JO - Japanese journal of applied physics
JF - Japanese journal of applied physics
IS - 4
M1 - 04EH08
ER -