Effects of hydrogen dilution on electron density in multi-hollow discharges with magnetic field for A-Si:H film deposition

Kazunori Koga, Yuuki Kawashima, Kenta Nakahara, Takeaki Matsunaga, William Makoto Nakamura, Masaharu Shiratani

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We have measured dependence of electron density ne on hydrogen dilution ratio R= [H2]/([SiH4]+[H2]) in the multi-hollow discharges with or without magnetic fields to obtain information about the deposition rate enhancement due to hydrogen dilution and applying the magnetic fields. The R dependence of the ne did not correlate with that of the deposition rate. The ne exponentially decreases with a distance from the discharges z. The ne decreases faster for higher R. These complicated behaviors of ne may be explained by electron attachment to the clusters generated in the SiH4+H2 discharges. For R=0, the ne was almost same value regardless with or without magnetic fields. For R=1, ne with magnetic fields was 1/10 of that without magnetic fields. We also found that, for R=0, ne drastically decreased with increasing the z, while for R=1, ne showed a gradual decrease with z. The effects of applying magnetic fields on the deposition are unclear but applying the magnetic fields may affect the electron energy distribution.

Original languageEnglish
Title of host publicationProgram - 35th IEEE Photovoltaic Specialists Conference, PVSC 2010
Pages3718-3721
Number of pages4
DOIs
Publication statusPublished - 2010
Event35th IEEE Photovoltaic Specialists Conference, PVSC 2010 - Honolulu, HI, United States
Duration: Jun 20 2010Jun 25 2010

Publication series

NameConference Record of the IEEE Photovoltaic Specialists Conference
ISSN (Print)0160-8371

Other

Other35th IEEE Photovoltaic Specialists Conference, PVSC 2010
Country/TerritoryUnited States
CityHonolulu, HI
Period6/20/106/25/10

All Science Journal Classification (ASJC) codes

  • Control and Systems Engineering
  • Industrial and Manufacturing Engineering
  • Electrical and Electronic Engineering

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