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Effects of gas flow rate on deposition rate and number of Si clusters incorporated into a-Si:H films
Susumu Toko, Yoshihiro Torigoe, Kimitaka Keya, Hyunwoong Seo, Naho Itagaki, Kazunori Koga, Masaharu Shiratani
Research output: Contribution to journal › Article › peer-review
7
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(Scopus)