Effects of amplitude modulation of rf discharge voltage on growth of nano-particles in reactive plasmas

Kunihiro Kamataki; Hiroshi Miyata; Kazunori Koga; Giichiro Uchida; Naho Itagaki; Daisuke Yamashita; Hidefumi Matsuzaki; Masaharu Shiratani

doi:10.1109/TENCON.2010.5686456

Effects of amplitude modulation of rf discharge voltage on growth of nano-particles in reactive plasmas

Kunihiro Kamataki, Hiroshi Miyata, Kazunori Koga, Giichiro Uchida, Naho Itagaki, Daisuke Yamashita, Hidefumi Matsuzaki, Masaharu Shiratani

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

2 Citations (Scopus)

Abstract

We have first conformed the effects of amplitude modulation (AM) of rf discharge voltage on growth of nano-particles in plasma CVD. This method of AM was used to control fluctuation level of plasma parameters, and allow us to investigate the causal relationship between the nano-particle property and plasma fluctuations. We found the ratio of power of single mode to that harmonic mode is negligible small until fluctuation level of amplitude modulated rf peak-to-peak voltage becomes roughly 20 %. The growth of nano-particles during rf discharge decreased as induced plasma fluctuation level increases.

Original language	English
Title of host publication	TENCON 2010 - 2010 IEEE Region 10 Conference
Pages	1943-1947
Number of pages	5
DOIs	https://doi.org/10.1109/TENCON.2010.5686456
Publication status	Published - 2010
Event	2010 IEEE Region 10 Conference, TENCON 2010 - Fukuoka, Japan Duration: Nov 21 2010 → Nov 24 2010

Other

Other	2010 IEEE Region 10 Conference, TENCON 2010
Country/Territory	Japan
City	Fukuoka
Period	11/21/10 → 11/24/10

All Science Journal Classification (ASJC) codes

Electrical and Electronic Engineering
Computer Science Applications

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10.1109/TENCON.2010.5686456

Cite this

Kamataki, K, Miyata, H, Koga, K, Uchida, G, Itagaki, N, Yamashita, D, Matsuzaki, H & Shiratani, M 2010, Effects of amplitude modulation of rf discharge voltage on growth of nano-particles in reactive plasmas. in TENCON 2010 - 2010 IEEE Region 10 Conference., 5686456, pp. 1943-1947, 2010 IEEE Region 10 Conference, TENCON 2010, Fukuoka, Japan, 11/21/10. https://doi.org/10.1109/TENCON.2010.5686456

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title = "Effects of amplitude modulation of rf discharge voltage on growth of nano-particles in reactive plasmas",

abstract = "We have first conformed the effects of amplitude modulation (AM) of rf discharge voltage on growth of nano-particles in plasma CVD. This method of AM was used to control fluctuation level of plasma parameters, and allow us to investigate the causal relationship between the nano-particle property and plasma fluctuations. We found the ratio of power of single mode to that harmonic mode is negligible small until fluctuation level of amplitude modulated rf peak-to-peak voltage becomes roughly 20 %. The growth of nano-particles during rf discharge decreased as induced plasma fluctuation level increases.",

author = "Kunihiro Kamataki and Hiroshi Miyata and Kazunori Koga and Giichiro Uchida and Naho Itagaki and Daisuke Yamashita and Hidefumi Matsuzaki and Masaharu Shiratani",

year = "2010",

doi = "10.1109/TENCON.2010.5686456",

language = "English",

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AU - Kamataki, Kunihiro

AU - Miyata, Hiroshi

AU - Koga, Kazunori

AU - Uchida, Giichiro

AU - Itagaki, Naho

AU - Yamashita, Daisuke

AU - Matsuzaki, Hidefumi

AU - Shiratani, Masaharu

PY - 2010

Y1 - 2010

N2 - We have first conformed the effects of amplitude modulation (AM) of rf discharge voltage on growth of nano-particles in plasma CVD. This method of AM was used to control fluctuation level of plasma parameters, and allow us to investigate the causal relationship between the nano-particle property and plasma fluctuations. We found the ratio of power of single mode to that harmonic mode is negligible small until fluctuation level of amplitude modulated rf peak-to-peak voltage becomes roughly 20 %. The growth of nano-particles during rf discharge decreased as induced plasma fluctuation level increases.

AB - We have first conformed the effects of amplitude modulation (AM) of rf discharge voltage on growth of nano-particles in plasma CVD. This method of AM was used to control fluctuation level of plasma parameters, and allow us to investigate the causal relationship between the nano-particle property and plasma fluctuations. We found the ratio of power of single mode to that harmonic mode is negligible small until fluctuation level of amplitude modulated rf peak-to-peak voltage becomes roughly 20 %. The growth of nano-particles during rf discharge decreased as induced plasma fluctuation level increases.

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DO - 10.1109/TENCON.2010.5686456

M3 - Conference contribution

AN - SCOPUS:79951665071

SN - 9781424468904

SP - 1943

EP - 1947

BT - TENCON 2010 - 2010 IEEE Region 10 Conference

T2 - 2010 IEEE Region 10 Conference, TENCON 2010

Y2 - 21 November 2010 through 24 November 2010

ER -

Effects of amplitude modulation of rf discharge voltage on growth of nano-particles in reactive plasmas

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