Effect of surface pH on electrodeposited Ni films

M. Motoyama, Y. Fukunaka, T. Sakka, Y. H. Ogata

Research output: Contribution to journalArticlepeer-review

45 Citations (Scopus)

Abstract

Ni metal was potentiostatically electrodeposited on a vertical plane cathode in a Watts bath in order to determine the effect of the cathode surface pH on the Ni film microstructure. Polarization curves and current efficiencies were measured at pH values of 1.5, 3.4, and 5.5. The surface pH value (pHs) was estimated from the measured partial current density for hydrogen gas evolution based on a steady-state one-dimensional mass transfer model. Any species relating to the buffering function through the dissociation reactions (HSO4-, H3 BO3, Ni4 (OH) 4 4+, H3 O+, OH-) were taken into account. The pHs abruptly rose to above 6 as the partial current density for H2 gas evolution increased. The preferred orientation of electrodeposited Ni thin film was plotted in electrode potential- pHs diagram. It was found that the transition boundary between {110} and {100} preferred orientations was located along a ridge 500 mV below the H+ H2 equilibrium potential line. This relationship suggests that the dissolved hydrogen atoms in Ni metal are partly responsible for the evolution of structural texture of the Ni films.

Original languageEnglish
Pages (from-to)C502-C508
JournalJournal of the Electrochemical Society
Volume153
Issue number7
DOIs
Publication statusPublished - Jul 2006
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Renewable Energy, Sustainability and the Environment
  • Surfaces, Coatings and Films
  • Electrochemistry
  • Materials Chemistry

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