Direct etching of poly(methyl methacrylate) using laser plasma soft X-rays

Shuichi Torii, Tetsuya Makimura, Kouta Okazaki, Daisuke Nakamura, Akihiko Takahashi, Tatsuo Okada, Hiroyuki Niino, Kouichi Murakami

Research output: Contribution to journalArticlepeer-review

10 Citations (Scopus)

Abstract

We have investigated direct etching of poly(methyl methacrylate) (PMMA) using laser plasma soft X-rays. We focused soft X-rays of 6-25 nm on PMMA sheets efficiently using an Au coated ellipsoidal mirror. 7 × 10-2 2% of laser energy is estimated to be converted to soft X-rays that was incident to the PMMA sheets. We found that PMMA surfaces are etched beyond a threshold power density. The energy density of absorbed soft X-rays at the threshold is 7 kJ/cm3. The results suggest that etching is governed by decomposition into fragments.

Original languageEnglish
Article number066502
JournalApplied Physics Express
Volume3
Issue number6
DOIs
Publication statusPublished - Jun 2010

All Science Journal Classification (ASJC) codes

  • General Engineering
  • General Physics and Astronomy

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