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Diffusion of vanadium in silicon
Taizoh Sadoh
, Hiroshi Nakashima
Electronic Devices
Research output
:
Contribution to journal
›
Article
›
peer-review
26
Citations (Scopus)
Overview
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Engineering
Silicon
100%
Diffusion
33%
Measurement
33%
Temperature Range
33%
Experiments
16%
Interstitials
16%
Annealing
16%
Diffusion Coefficient
16%
Depletion Region
16%
Concentration Profile
16%
Depth Profile
16%
Deep Level
16%
Biochemistry, Genetics and Molecular Biology
Vanadium
50%
Temperature
33%
Facilitated Diffusion
33%
Deep-Level Transient Spectroscopy
33%
Experiment
16%
Diffusion Coefficient
16%