Abstract
We propose a device capable of massively parallel nanoscale lithography and data storage due to a uniform array of diamond tips. A prototype device is constructed and demonstrated by forming patterns on silicon wafer surfaces. In our initial study, surface layers on silicon are selectively removed in parallel by mechanical ablation and microsized carbon islands are deposited in air. Nearly all the lithographic and data storage techniques derived from proximal probe techniques are expected to benefit from the diamond tip array method.
Original language | English |
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Pages (from-to) | L562-L564 |
Journal | Japanese Journal of Applied Physics |
Volume | 37 |
Issue number | 5 PART A |
DOIs | |
Publication status | Published - May 1 1998 |
All Science Journal Classification (ASJC) codes
- Engineering(all)
- Physics and Astronomy(all)