Diagnostics of ablation dynamics of tin micro-droplet for EUV lithography light source

D. Nakamura; K. Okazaki; T. Akiyama; K. Toya; A. Takahashi; T. Okada; T. Yanagida; Y. Ueno; Y. Sasaki; T. Suganuma; M. Nakano; H. Komori; A. Sumitani; A. Endo

doi:10.1109/CLEOPR.2009.5292242

Diagnostics of ablation dynamics of tin micro-droplet for EUV lithography light source

D. Nakamura, K. Okazaki, T. Akiyama, K. Toya, A. Takahashi, T. Okada, T. Yanagida, Y. Ueno, Y. Sasaki, T. Suganuma, M. Nakano, H. Komori, A. Sumitani, A. Endo

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

The ablation dynamics of tin micro-droplet target irradiated by double pulses was investigated for extreme ultraviolet lithography source. Debris from Sn droplet target was visualized by the laser-induced fluorescence imaging and shadowgraph imaging.

Original language	English
Title of host publication	CLEO/Pacific Rim 2009 - 8th Pacific Rim Conference on Lasers and Electro-Optics
DOIs	https://doi.org/10.1109/CLEOPR.2009.5292242
Publication status	Published - 2009
Event	CLEO/Pacific Rim 2009 - 8th Pacific Rim Conference on Lasers and Electro-Optics - Shanghai, China Duration: Aug 30 2009 → Sept 3 2009

Publication series

Name	Pacific Rim Conference on Lasers and Electro-Optics, CLEO - Technical Digest

Other

Other	CLEO/Pacific Rim 2009 - 8th Pacific Rim Conference on Lasers and Electro-Optics
Country/Territory	China
City	Shanghai
Period	8/30/09 → 9/3/09

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Condensed Matter Physics
Electrical and Electronic Engineering

Access to Document

10.1109/CLEOPR.2009.5292242

Cite this

Nakamura, D., Okazaki, K., Akiyama, T., Toya, K., Takahashi, A., Okada, T., Yanagida, T., Ueno, Y., Sasaki, Y., Suganuma, T., Nakano, M., Komori, H., Sumitani, A., & Endo, A. (2009). Diagnostics of ablation dynamics of tin micro-droplet for EUV lithography light source. In CLEO/Pacific Rim 2009 - 8th Pacific Rim Conference on Lasers and Electro-Optics Article 5292242 (Pacific Rim Conference on Lasers and Electro-Optics, CLEO - Technical Digest). https://doi.org/10.1109/CLEOPR.2009.5292242

Diagnostics of ablation dynamics of tin micro-droplet for EUV lithography light source. / Nakamura, D.; Okazaki, K.; Akiyama, T. et al.
CLEO/Pacific Rim 2009 - 8th Pacific Rim Conference on Lasers and Electro-Optics. 2009. 5292242 (Pacific Rim Conference on Lasers and Electro-Optics, CLEO - Technical Digest).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Nakamura, D, Okazaki, K, Akiyama, T, Toya, K, Takahashi, A, Okada, T, Yanagida, T, Ueno, Y, Sasaki, Y, Suganuma, T, Nakano, M, Komori, H, Sumitani, A & Endo, A 2009, Diagnostics of ablation dynamics of tin micro-droplet for EUV lithography light source. in CLEO/Pacific Rim 2009 - 8th Pacific Rim Conference on Lasers and Electro-Optics., 5292242, Pacific Rim Conference on Lasers and Electro-Optics, CLEO - Technical Digest, CLEO/Pacific Rim 2009 - 8th Pacific Rim Conference on Lasers and Electro-Optics, Shanghai, China, 8/30/09. https://doi.org/10.1109/CLEOPR.2009.5292242

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abstract = "The ablation dynamics of tin micro-droplet target irradiated by double pulses was investigated for extreme ultraviolet lithography source. Debris from Sn droplet target was visualized by the laser-induced fluorescence imaging and shadowgraph imaging.",

author = "D. Nakamura and K. Okazaki and T. Akiyama and K. Toya and A. Takahashi and T. Okada and T. Yanagida and Y. Ueno and Y. Sasaki and T. Suganuma and M. Nakano and H. Komori and A. Sumitani and A. Endo",

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AU - Nakamura, D.

AU - Okazaki, K.

AU - Akiyama, T.

AU - Toya, K.

AU - Takahashi, A.

AU - Okada, T.

AU - Yanagida, T.

AU - Ueno, Y.

AU - Sasaki, Y.

AU - Suganuma, T.

AU - Nakano, M.

AU - Komori, H.

AU - Sumitani, A.

AU - Endo, A.

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SN - 9781424438303

T3 - Pacific Rim Conference on Lasers and Electro-Optics, CLEO - Technical Digest

BT - CLEO/Pacific Rim 2009 - 8th Pacific Rim Conference on Lasers and Electro-Optics

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ER -

Diagnostics of ablation dynamics of tin micro-droplet for EUV lithography light source

Abstract

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