Development of large diameter ECR plasma source

Yoshinobu Kawai, Kiichiro Uchino, Hiroshi Muta, Shinji Kawai, Tobias Röwf

Research output: Contribution to journalArticlepeer-review

12 Citations (Scopus)


To develop ECR plasma source for industrial applications, we produced a large diameter ECR plasma and examined radial profiles of the ion saturation current as a function of pressure and power. It was found that ECR plasma uniform over 300 mm is produced for pressures higher than 1 mTorr and the electron temperature decreases with increasing pressures.

Original languageEnglish
Pages (from-to)1381-1384
Number of pages4
Issue number12
Publication statusPublished - Jun 25 2010

All Science Journal Classification (ASJC) codes

  • Instrumentation
  • Condensed Matter Physics
  • Surfaces, Coatings and Films


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