Abstract
We report on our development of hot plastic deformation of silicon wafer for high-resolution and light-weight X-ray optics. The highly polished silicon wafer with an excellent flat surface is a promising candidate for the next generation space X-ray telescopes. Deformation accuracy and stability, especially if elastic deformation is used, are issues. The hot plastic deformation of the silicon wafer allows us 3-dimensional shaping without spring back after the deformation. As a first step of R & D, we conducted the hot plastic deformation of 4-inch silicon (111) wafers with a thickness of 300 μm by using hemispherical dies with a curvature radius of 1000 mm. The deformed wafer kept good surface quality but showed a slightly large curvature of 1030 mm. We measured the X-ray reflectivity of the deformed wafer at Al K α 1.49 keV. For the first time, we detected the total X-ray reflection on the deformed wafer. Estimated rms surface roughness was 0-1 nm and no significant degradation from the bare silicon wafers was seen.
Original language | English |
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Title of host publication | EUV and X-Ray Optics |
Subtitle of host publication | Synergy between Laboratory and Space |
Volume | 7360 |
DOIs | |
Publication status | Published - Sept 14 2009 |
Externally published | Yes |
Event | EUV and X-Ray Optics: Synergy between Laboratory and Space - Prague, Czech Republic Duration: Apr 20 2009 → Apr 22 2009 |
Other
Other | EUV and X-Ray Optics: Synergy between Laboratory and Space |
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Country/Territory | Czech Republic |
City | Prague |
Period | 4/20/09 → 4/22/09 |
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Computer Science Applications
- Applied Mathematics
- Electrical and Electronic Engineering