Development of an AC electrical field tribochemical polishing technique to promote high-efficiency polishing for glass substrates - Effect of polishing characteristics with slurry dynamical behavior on polishing interface under an AC electric field

This paper presents to develop a novel high-efficiency polishing technique which combines applied an AC electric field polishing and tribochemical polishing. Here, the AC electric field polishing has the effect of controlling the slurry flow behavior and the tribochemical polishing has the effect of promotion of chemical reaction among the abrasives, glass substrates and water generated by high-speed relative velocity between the platen and glass substrate. This research focuses the slurry behaviour shown by applied strength of the various AC electric field using digital image processing. As a result, it was found that the slurry behavior with the AC electric field was improved compared to one and no electric field. And the locus area of slurry flow on the polishing area was linearly increased with the increment applied AC electric frequency. Furthermore, this research verified the correlation among the applied AC electric frequency, removal rate, surface roughness. As a result, it was clarified that the removal rate was positively correlated with the slurry locus area. In particular, the removal rate of the combined polishing technique improves about two and a half times with excellent smooth surface than the conventional polishing.