TY - JOUR
T1 - Determination of the c(2 × 2) structure formed on Cu(001) upon Li adsorption
T2 - a low-energy electron diffraction analysis
AU - Mizuno, Seigi
AU - Tochihara, Hiroshi
AU - Kawamura, Takaaki
N1 - Funding Information:
This work is partially supportedb y the Grant-in-Aid for Scientific Researchf rom the Ministry of Education,S ciencea nd Culture.
PY - 1993/8/20
Y1 - 1993/8/20
N2 - We have determined the c(2 × 2) structure formed on Cu(001) upon Li adsorption at 180 K by low-energy electron diffraction analysis. It is found that an overlayer of Li atoms sitting on the fourfold hollow sites (coverage 0.5) is preferred with a Cu-Li interlayer spacing of 1.96 ± 0.08 Å. The radius of the Li atom is 92% of the Li metallic one. The interlayer spacing between the first and second layers of Cu(001) is 1.81 ± 0.04 Å, and this is the same value of spacing of the clean Cu(001) surface.
AB - We have determined the c(2 × 2) structure formed on Cu(001) upon Li adsorption at 180 K by low-energy electron diffraction analysis. It is found that an overlayer of Li atoms sitting on the fourfold hollow sites (coverage 0.5) is preferred with a Cu-Li interlayer spacing of 1.96 ± 0.08 Å. The radius of the Li atom is 92% of the Li metallic one. The interlayer spacing between the first and second layers of Cu(001) is 1.81 ± 0.04 Å, and this is the same value of spacing of the clean Cu(001) surface.
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U2 - 10.1016/0039-6028(93)90317-D
DO - 10.1016/0039-6028(93)90317-D
M3 - Article
AN - SCOPUS:0027642127
SN - 0039-6028
VL - 293
SP - 239
EP - 245
JO - Surface Science
JF - Surface Science
IS - 3
ER -