TY - JOUR
T1 - Deposition of hydrogenated amorphous carbon films by CH4/Ar capacitively coupled plasma using tailored voltage waveform discharges
AU - Otaka, Michihiro
AU - Otomo, Hiroshi
AU - Ikeda, Kizuku
AU - Lai, Jian Syun
AU - Wakita, Daichi
AU - Kamataki, Kunihiro
AU - Koga, Kazunori
AU - Shiratani, Masaharu
AU - Nagamatsu, Daiki
AU - Shindo, Takahiro
AU - Matsudo, Tatsuo
N1 - Publisher Copyright:
© 2024 The Japan Society of Applied Physics.
PY - 2024/7/1
Y1 - 2024/7/1
N2 - We investigated the effects of tailored voltage waveform (TVW) discharges on the deposition of hydrogenated amorphous carbon (a-C:H) films in CH4/Ar capacitively coupled plasma. TVW discharges employ two driving radio frequencies (13.56 MHz and 27.12 MHz) and control their phase shifts to independently regulate ion bombardment energy (IBE) and ion flux. In this study, a-C:H films were deposited by changing DC-self bias with phase shift and constant applied voltage peak-to-peak. Additionally, we investigated phase-resolved optical emission spectroscopy (PROES) for plasma characterization. As a result, plasma-enhanced CVD (PECVD) for a-C:H films using TVW discharges realize control of film properties such as mass density, sp3 fraction, and H content, while keeping the deposition rate constant. Thus, it is suggested that TVW discharges realize the independent control of IBE and ion flux with high accuracy, highlighting its utility in a-C:H film depositions.
AB - We investigated the effects of tailored voltage waveform (TVW) discharges on the deposition of hydrogenated amorphous carbon (a-C:H) films in CH4/Ar capacitively coupled plasma. TVW discharges employ two driving radio frequencies (13.56 MHz and 27.12 MHz) and control their phase shifts to independently regulate ion bombardment energy (IBE) and ion flux. In this study, a-C:H films were deposited by changing DC-self bias with phase shift and constant applied voltage peak-to-peak. Additionally, we investigated phase-resolved optical emission spectroscopy (PROES) for plasma characterization. As a result, plasma-enhanced CVD (PECVD) for a-C:H films using TVW discharges realize control of film properties such as mass density, sp3 fraction, and H content, while keeping the deposition rate constant. Thus, it is suggested that TVW discharges realize the independent control of IBE and ion flux with high accuracy, highlighting its utility in a-C:H film depositions.
KW - amorphous carbon
KW - plasma enhanced chemical vapor deposition
KW - tailored voltage waveforms
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U2 - 10.35848/1347-4065/ad53b0
DO - 10.35848/1347-4065/ad53b0
M3 - Article
AN - SCOPUS:85199673646
SN - 0021-4922
VL - 63
JO - Japanese Journal of Applied Physics
JF - Japanese Journal of Applied Physics
IS - 7
M1 - 076001
ER -