Deposition of a-Si: H films by ECR plasma CVD using large diameter multi-slot antennae

Yoko Ueda, Hideaki Teranishi, Masayoshi Tanaka, Shunjiro Shinohara, Yoshinobu Kawai

Research output: Contribution to journalArticlepeer-review

8 Citations (Scopus)

Abstract

A large diameter electron cyclotron resonance plasma was produced with a multi-slot antenna. The radial profile of the ion saturation current was examined as a function of input microwave power, gas pressure and magnetic mirror coil current to determine the experimental conditions necessary for a large diameter and uniform plasma at low pressure. Furthermore, the deposition of a-Si: H films was attempted onto 8 inch glass substrates using a gas mixture SiH4-10% He.

Original languageEnglish
Pages (from-to)503-507
Number of pages5
JournalSurface and Coatings Technology
Volume74-75
Issue numberPART 1
DOIs
Publication statusPublished - Sept 1995
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • General Chemistry
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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