CVD diamond coating on WC-Co cutting tool using ECR MPCVD apparatus via electrophoretic seeding pretreatment

Toshiki Tsubota; Shintaro Ida; Naoki Okada; Masanori Nagata; Yasumichi Matsumoto; Nobumitsu Yatsushiro

doi:10.1016/S0257-8972(03)00033-1

CVD diamond coating on WC-Co cutting tool using ECR MPCVD apparatus via electrophoretic seeding pretreatment

Toshiki Tsubota
, Shintaro Ida
, Naoki Okada
, Masanori Nagata
, Yasumichi Matsumoto
, Nobumitsu Yatsushiro

Research output: Contribution to journal › Article › peer-review

10 Citations (Scopus)

Abstract

Electrophoresis was utilized as a seeding process for CVD diamond synthesis. The number of diamond particles deposited depended on the electrophoretic conditions. After the electrophoretic deposition process, CVD diamond film was synthesized on WC-Co substrate using ECR microwave plasma CVD apparatus. The density of nuclei after the CVD process was insufficient for the formation of diamond film in the case of no Co removal by acid, when a scratching pretreatment was adopted. On the other hand, electrophoretic deposition was effective for the formation of film-type deposits.

Original language	English
Pages (from-to)	262-265
Number of pages	4
Journal	Surface and Coatings Technology
Volume	169-170
DOIs	https://doi.org/10.1016/S0257-8972(03)00033-1
Publication status	Published - Jun 2 2003
Externally published	Yes

All Science Journal Classification (ASJC) codes

General Chemistry
Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films
Materials Chemistry

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10.1016/S0257-8972(03)00033-1

Cite this

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title = "CVD diamond coating on WC-Co cutting tool using ECR MPCVD apparatus via electrophoretic seeding pretreatment",

abstract = "Electrophoresis was utilized as a seeding process for CVD diamond synthesis. The number of diamond particles deposited depended on the electrophoretic conditions. After the electrophoretic deposition process, CVD diamond film was synthesized on WC-Co substrate using ECR microwave plasma CVD apparatus. The density of nuclei after the CVD process was insufficient for the formation of diamond film in the case of no Co removal by acid, when a scratching pretreatment was adopted. On the other hand, electrophoretic deposition was effective for the formation of film-type deposits.",

author = "Toshiki Tsubota and Shintaro Ida and Naoki Okada and Masanori Nagata and Yasumichi Matsumoto and Nobumitsu Yatsushiro",

year = "2003",

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language = "English",

volume = "169-170",

pages = "262--265",

journal = "Surface and Coatings Technology",

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TY - JOUR

T1 - CVD diamond coating on WC-Co cutting tool using ECR MPCVD apparatus via electrophoretic seeding pretreatment

AU - Tsubota, Toshiki

AU - Ida, Shintaro

AU - Okada, Naoki

AU - Nagata, Masanori

AU - Matsumoto, Yasumichi

AU - Yatsushiro, Nobumitsu

PY - 2003/6/2

Y1 - 2003/6/2

N2 - Electrophoresis was utilized as a seeding process for CVD diamond synthesis. The number of diamond particles deposited depended on the electrophoretic conditions. After the electrophoretic deposition process, CVD diamond film was synthesized on WC-Co substrate using ECR microwave plasma CVD apparatus. The density of nuclei after the CVD process was insufficient for the formation of diamond film in the case of no Co removal by acid, when a scratching pretreatment was adopted. On the other hand, electrophoretic deposition was effective for the formation of film-type deposits.

AB - Electrophoresis was utilized as a seeding process for CVD diamond synthesis. The number of diamond particles deposited depended on the electrophoretic conditions. After the electrophoretic deposition process, CVD diamond film was synthesized on WC-Co substrate using ECR microwave plasma CVD apparatus. The density of nuclei after the CVD process was insufficient for the formation of diamond film in the case of no Co removal by acid, when a scratching pretreatment was adopted. On the other hand, electrophoretic deposition was effective for the formation of film-type deposits.

UR - https://www.scopus.com/pages/publications/0038469748

UR - https://www.scopus.com/pages/publications/0038469748#tab=citedBy

U2 - 10.1016/S0257-8972(03)00033-1

DO - 10.1016/S0257-8972(03)00033-1

M3 - Article

AN - SCOPUS:0038469748

SN - 0257-8972

VL - 169-170

SP - 262

EP - 265

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

ER -

CVD diamond coating on WC-Co cutting tool using ECR MPCVD apparatus via electrophoretic seeding pretreatment

Abstract

All Science Journal Classification (ASJC) codes

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