Crystallographic orientation contrast associated with Ga+ ion channelling for Fe and Cu in focused ion beam method

Y. Yahiro, K. Kaneko, T. Fujita, W. J. Moon, Z. Horita

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    19 Citations (Scopus)

    Abstract

    In this study, Cu and Fe single crystals are used to examine the change in secondary electron intensity associated with Ga+ ion channelling in a focused ion beam (FIB) system. The single crystals having three different orientations are tilted with respect to the beam incidence and the resulting variation in the secondary electron intensity is measured through the variation in brightness of the crystals. It is shown that intensity minima appear at the beam directions normal to the lower indices of the crystal orientations. The appearance of the intensity minima including the magnitude of the minima is consistent with the prediction based on the event of ion channelling in the crystal and is affected by the crystal structure. The effect of background on the intensity minima is discussed in this study. It is suggested that the presence of the intensity minima may be used to identify a crystal orientation including a crystal structure.

    Original languageEnglish
    Pages (from-to)571-576
    Number of pages6
    JournalJournal of Electron Microscopy
    Volume53
    Issue number5
    DOIs
    Publication statusPublished - 2004

    All Science Journal Classification (ASJC) codes

    • Instrumentation

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