Correlation between volume fraction of silicon clusters in amorphous silicon films and optical emission properties of Si* and SiH*

Yeonwon Kim; Kosuke Hatozaki; Yuji Hashimoto; Giichiro Uchida; Kunihiro Kamataki; Naho Itagaki; Hyunwoong Seo; Kazunori Koga; Masaharu Shiratani

doi:10.7567/JJAP.52.11NA07

Correlation between volume fraction of silicon clusters in amorphous silicon films and optical emission properties of Si* and SiH*

Yeonwon Kim, Kosuke Hatozaki, Yuji Hashimoto, Giichiro Uchida, Kunihiro Kamataki, Naho Itagaki, Hyunwoong Seo, Kazunori Koga, Masaharu Shiratani

Research output: Contribution to journal › Article › peer-review

4 Citations (Scopus)

Abstract

The volume fraction of silicon clusters in amorphous silicon (a-Si:H) films has been investigated using specially designed quartz crystal microbalances (QCMs) together with optical emission spectroscopy (OES). The optical emission intensities of Si* and SiH* and their intensity ratios are selected for comparison with the QCM results. We show that the volume fraction of silicon clusters strongly correlates with not only the electron temperature but also the SiH* intensity. This suggests that the ratios of Si*/SiH* and SiH* can be used to predict the volume fraction of Si clusters in a-Si:H films.

Original language	English
Article number	11NA07
Journal	Japanese journal of applied physics
Volume	52
Issue number	11 PART 2
DOIs	https://doi.org/10.7567/JJAP.52.11NA07
Publication status	Published - Nov 2013

All Science Journal Classification (ASJC) codes

Engineering(all)
Physics and Astronomy(all)

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10.7567/JJAP.52.11NA07

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title = "Correlation between volume fraction of silicon clusters in amorphous silicon films and optical emission properties of Si* and SiH*",

abstract = "The volume fraction of silicon clusters in amorphous silicon (a-Si:H) films has been investigated using specially designed quartz crystal microbalances (QCMs) together with optical emission spectroscopy (OES). The optical emission intensities of Si* and SiH* and their intensity ratios are selected for comparison with the QCM results. We show that the volume fraction of silicon clusters strongly correlates with not only the electron temperature but also the SiH* intensity. This suggests that the ratios of Si*/SiH* and SiH* can be used to predict the volume fraction of Si clusters in a-Si:H films.",

author = "Yeonwon Kim and Kosuke Hatozaki and Yuji Hashimoto and Giichiro Uchida and Kunihiro Kamataki and Naho Itagaki and Hyunwoong Seo and Kazunori Koga and Masaharu Shiratani",

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doi = "10.7567/JJAP.52.11NA07",

language = "English",

volume = "52",

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TY - JOUR

T1 - Correlation between volume fraction of silicon clusters in amorphous silicon films and optical emission properties of Si* and SiH*

AU - Kim, Yeonwon

AU - Hatozaki, Kosuke

AU - Hashimoto, Yuji

AU - Uchida, Giichiro

AU - Kamataki, Kunihiro

AU - Itagaki, Naho

AU - Seo, Hyunwoong

AU - Koga, Kazunori

AU - Shiratani, Masaharu

PY - 2013/11

Y1 - 2013/11

N2 - The volume fraction of silicon clusters in amorphous silicon (a-Si:H) films has been investigated using specially designed quartz crystal microbalances (QCMs) together with optical emission spectroscopy (OES). The optical emission intensities of Si* and SiH* and their intensity ratios are selected for comparison with the QCM results. We show that the volume fraction of silicon clusters strongly correlates with not only the electron temperature but also the SiH* intensity. This suggests that the ratios of Si*/SiH* and SiH* can be used to predict the volume fraction of Si clusters in a-Si:H films.

AB - The volume fraction of silicon clusters in amorphous silicon (a-Si:H) films has been investigated using specially designed quartz crystal microbalances (QCMs) together with optical emission spectroscopy (OES). The optical emission intensities of Si* and SiH* and their intensity ratios are selected for comparison with the QCM results. We show that the volume fraction of silicon clusters strongly correlates with not only the electron temperature but also the SiH* intensity. This suggests that the ratios of Si*/SiH* and SiH* can be used to predict the volume fraction of Si clusters in a-Si:H films.

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M3 - Article

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JO - Japanese journal of applied physics

JF - Japanese journal of applied physics

IS - 11 PART 2

M1 - 11NA07

ER -

Correlation between volume fraction of silicon clusters in amorphous silicon films and optical emission properties of Si* and SiH*

Abstract

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